The high-temperature stability of chemically vapor-deposited tungsten-silicon couples rapid thermal annealed in ammonia and argon.
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| Title: | The high-temperature stability of chemically vapor-deposited tungsten-silicon couples rapid thermal annealed in ammonia and argon. |
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| Authors: | Broadbent, E. K., Morgan, A. E., Flanner, J. M., Coulman, B., Sadana, D. K., Burrow, B. J., Ellwanger, R. C. |
| Source: | Journal of Applied Physics. 12/15/1988, Vol. 64 Issue 12, p6721. 6p. |
| Database: | Academic Search Ultimate |
| FullText | Text: Availability: 0 |
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| Header | DbId: asn DbLabel: Academic Search Ultimate An: 7653356 AccessLevel: 2 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: The high-temperature stability of chemically vapor-deposited tungsten-silicon couples rapid thermal annealed in ammonia and argon. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AR" term="%22Broadbent%2C+E%2E+K%2E%22">Broadbent, E. K.</searchLink><br /><searchLink fieldCode="AR" term="%22Morgan%2C+A%2E+E%2E%22">Morgan, A. E.</searchLink><br /><searchLink fieldCode="AR" term="%22Flanner%2C+J%2E+M%2E%22">Flanner, J. M.</searchLink><br /><searchLink fieldCode="AR" term="%22Coulman%2C+B%2E%22">Coulman, B.</searchLink><br /><searchLink fieldCode="AR" term="%22Sadana%2C+D%2E+K%2E%22">Sadana, D. K.</searchLink><br /><searchLink fieldCode="AR" term="%22Burrow%2C+B%2E+J%2E%22">Burrow, B. J.</searchLink><br /><searchLink fieldCode="AR" term="%22Ellwanger%2C+R%2E+C%2E%22">Ellwanger, R. C.</searchLink> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Journal+of+Applied+Physics%22">Journal of Applied Physics</searchLink>. 12/15/1988, Vol. 64 Issue 12, p6721. 6p. |
| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=asn&AN=7653356 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1063/1.342003 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 6 StartPage: 6721 Titles: – TitleFull: The high-temperature stability of chemically vapor-deposited tungsten-silicon couples rapid thermal annealed in ammonia and argon. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Broadbent, E. K. – PersonEntity: Name: NameFull: Morgan, A. E. – PersonEntity: Name: NameFull: Flanner, J. M. – PersonEntity: Name: NameFull: Coulman, B. – PersonEntity: Name: NameFull: Sadana, D. K. – PersonEntity: Name: NameFull: Burrow, B. J. – PersonEntity: Name: NameFull: Ellwanger, R. C. IsPartOfRelationships: – BibEntity: Dates: – D: 15 M: 12 Text: 12/15/1988 Type: published Y: 1988 Identifiers: – Type: issn-print Value: 00218979 Numbering: – Type: volume Value: 64 – Type: issue Value: 12 Titles: – TitleFull: Journal of Applied Physics Type: main |
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