The high-temperature stability of chemically vapor-deposited tungsten-silicon couples rapid thermal annealed in ammonia and argon.

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Title: The high-temperature stability of chemically vapor-deposited tungsten-silicon couples rapid thermal annealed in ammonia and argon.
Authors: Broadbent, E. K., Morgan, A. E., Flanner, J. M., Coulman, B., Sadana, D. K., Burrow, B. J., Ellwanger, R. C.
Source: Journal of Applied Physics. 12/15/1988, Vol. 64 Issue 12, p6721. 6p.
Database: Academic Search Ultimate
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An: 7653356
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  Data: The high-temperature stability of chemically vapor-deposited tungsten-silicon couples rapid thermal annealed in ammonia and argon.
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  Data: <searchLink fieldCode="AR" term="%22Broadbent%2C+E%2E+K%2E%22">Broadbent, E. K.</searchLink><br /><searchLink fieldCode="AR" term="%22Morgan%2C+A%2E+E%2E%22">Morgan, A. E.</searchLink><br /><searchLink fieldCode="AR" term="%22Flanner%2C+J%2E+M%2E%22">Flanner, J. M.</searchLink><br /><searchLink fieldCode="AR" term="%22Coulman%2C+B%2E%22">Coulman, B.</searchLink><br /><searchLink fieldCode="AR" term="%22Sadana%2C+D%2E+K%2E%22">Sadana, D. K.</searchLink><br /><searchLink fieldCode="AR" term="%22Burrow%2C+B%2E+J%2E%22">Burrow, B. J.</searchLink><br /><searchLink fieldCode="AR" term="%22Ellwanger%2C+R%2E+C%2E%22">Ellwanger, R. C.</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Applied+Physics%22">Journal of Applied Physics</searchLink>. 12/15/1988, Vol. 64 Issue 12, p6721. 6p.
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=asn&AN=7653356
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        Value: 10.1063/1.342003
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      – Code: eng
        Text: English
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        StartPage: 6721
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      – TitleFull: The high-temperature stability of chemically vapor-deposited tungsten-silicon couples rapid thermal annealed in ammonia and argon.
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            NameFull: Broadbent, E. K.
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            NameFull: Morgan, A. E.
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            NameFull: Flanner, J. M.
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            NameFull: Sadana, D. K.
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              Text: 12/15/1988
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              Y: 1988
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