Terrasi, A., Scalese, S., Adorno, R., Ferlito, E., Spadafora, M., & Rimini, E. (2002). Rapid thermal oxidation of epitaxial SiGe thin films. Materials Science & Engineering: B, 89(1-3), 269. https://doi.org/10.1016/S0921-5107(01)00797-8
Chicago Style (17th ed.) CitationTerrasi, A., S. Scalese, R. Adorno, E. Ferlito, M. Spadafora, and E. Rimini. "Rapid Thermal Oxidation of Epitaxial SiGe Thin Films." Materials Science & Engineering: B 89, no. 1-3 (2002): 269. https://doi.org/10.1016/S0921-5107(01)00797-8.
MLA (9th ed.) CitationTerrasi, A., et al. "Rapid Thermal Oxidation of Epitaxial SiGe Thin Films." Materials Science & Engineering: B, vol. 89, no. 1-3, 2002, p. 269, https://doi.org/10.1016/S0921-5107(01)00797-8.
Warning: These citations may not always be 100% accurate.