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Rapid thermal oxidation of epitaxial SiGe thin films

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Title: Rapid thermal oxidation of epitaxial SiGe thin films
Authors: Terrasi, A.1,2 terrasi@ct.infn.it, Scalese, S.2, Adorno, R.1, Ferlito, E.1, Spadafora, M.1, Rimini, E.1,2
Source: Materials Science & Engineering: B. Feb2002, Vol. 89 Issue 1-3, p269. 5p.
Database: Academic Search Ultimate
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DbLabel: Academic Search Ultimate
An: 7747705
AccessLevel: 2
PubType: Academic Journal
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PreciseRelevancyScore: 0
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  Data: <searchLink fieldCode="JN" term="%22Materials+Science+%26+Engineering%3A+B%22">Materials Science & Engineering: B</searchLink>. Feb2002, Vol. 89 Issue 1-3, p269. 5p.
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=asn&AN=7747705
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        Value: 10.1016/S0921-5107(01)00797-8
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        Text: English
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      – TitleFull: Rapid thermal oxidation of epitaxial SiGe thin films
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              Text: Feb2002
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              Y: 2002
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