APA (7th ed.) Citation

Feng, L., Li, N., Tian, H., & Liu, Z. (2014). Current conduction mechanisms in HfO2 and SrHfON thin films prepared by magnetron sputtering. Journal of Materials Science, 49(4), 1875. https://doi.org/10.1007/s10853-013-7876-6

Chicago Style (17th ed.) Citation

Feng, Li-ping, Ning Li, Hao Tian, and Zheng-tang Liu. "Current Conduction Mechanisms in HfO2 and SrHfON Thin Films Prepared by Magnetron Sputtering." Journal of Materials Science 49, no. 4 (2014): 1875. https://doi.org/10.1007/s10853-013-7876-6.

MLA (9th ed.) Citation

Feng, Li-ping, et al. "Current Conduction Mechanisms in HfO2 and SrHfON Thin Films Prepared by Magnetron Sputtering." Journal of Materials Science, vol. 49, no. 4, 2014, p. 1875, https://doi.org/10.1007/s10853-013-7876-6.