APA (7th ed.) Citation

Bollanti, S., Bonfigli, F., Burattini, E., Di Lazzaro, P., Flora, F., Grilli, A., . . . Zheng, C. (2003). High-efficiency clean EUV plasma source at 10–30 nm, driven by a long-pulse-width excimer laser. Applied Physics B: Lasers & Optics, 76(3), 277. https://doi.org/10.1007/s00340-002-1088-0

Chicago Style (17th ed.) Citation

Bollanti, S., et al. "High-efficiency Clean EUV Plasma Source at 10–30 Nm, Driven by a Long-pulse-width Excimer Laser." Applied Physics B: Lasers & Optics 76, no. 3 (2003): 277. https://doi.org/10.1007/s00340-002-1088-0.

MLA (9th ed.) Citation

Bollanti, S., et al. "High-efficiency Clean EUV Plasma Source at 10–30 Nm, Driven by a Long-pulse-width Excimer Laser." Applied Physics B: Lasers & Optics, vol. 76, no. 3, 2003, p. 277, https://doi.org/10.1007/s00340-002-1088-0.