High-efficiency clean EUV plasma source at 10–30 nm, driven by a long-pulse-width excimer laser.
Saved in:
| Title: | High-efficiency clean EUV plasma source at 10–30 nm, driven by a long-pulse-width excimer laser. |
|---|---|
| Authors: | Bollanti, S., Bonfigli, F., Burattini, E., Di Lazzaro, P., Flora, F., Grilli, A., Letardi, T., Lisi, N., Marinai, A., Mezi, L., Murra, D., Zheng, C. |
| Source: | Applied Physics B: Lasers & Optics. 2003, Vol. 76 Issue 3, p277. 8p. |
| Database: | Academic Search Ultimate |
Be the first to leave a comment!
