APA (7th ed.) Citation

Fan, C., Shang, M., Li, B., Lin, Y., Wang, S., & Lee, W. (2014). A Self-Aligned a-IGZO Thin-Film Transistor Using a New Two-Photo-Mask Process with a Continuous Etching Scheme. Materials (1996-1944), 7(8), 5761. https://doi.org/10.3390/ma7085761

Chicago Style (17th ed.) Citation

Fan, Ching-Lin, Ming-Chi Shang, Bo-Jyun Li, Yu-Zuo Lin, Shea-Jue Wang, and Win-Der Lee. "A Self-Aligned A-IGZO Thin-Film Transistor Using a New Two-Photo-Mask Process with a Continuous Etching Scheme." Materials (1996-1944) 7, no. 8 (2014): 5761. https://doi.org/10.3390/ma7085761.

MLA (9th ed.) Citation

Fan, Ching-Lin, et al. "A Self-Aligned A-IGZO Thin-Film Transistor Using a New Two-Photo-Mask Process with a Continuous Etching Scheme." Materials (1996-1944), vol. 7, no. 8, 2014, p. 5761, https://doi.org/10.3390/ma7085761.