A Self-Aligned a-IGZO Thin-Film Transistor Using a New Two-Photo-Mask Process with a Continuous Etching Scheme.
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| Title: | A Self-Aligned a-IGZO Thin-Film Transistor Using a New Two-Photo-Mask Process with a Continuous Etching Scheme. |
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| Authors: | Ching-Lin Fan1,2 clfan@mail.ntust.edu.tw, Ming-Chi Shang1 d10019004@mail.ntust.edu.tw, Bo-Jyun Li1 m10019004@mail.ntust.edu.tw, Yu-Zuo Lin2 D9802312@mail.ntust.edu.tw, Shea-Jue Wang3 sjwang@ntut.edu.tw, Win-Der Lee4 leewd@mail.lit.edu.tw |
| Source: | Materials (1996-1944). Aug2014, Vol. 7 Issue 8, p5761-5768. 8p. 1 Color Photograph, 1 Diagram, 1 Chart, 3 Graphs. |
| Database: | Academic Search Ultimate |
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