APA (7th ed.) Citation

Huang, W., Liu, S., Dong, T., Wang, G., & Qin, C. (2015). Annealing and quenching effect in the localized states emission on nanosilicon fabricated by pulsed laser. Optics Communications, 342, 79. https://doi.org/10.1016/j.optcom.2014.12.041

Chicago Style (17th ed.) Citation

Huang, Wei-Qi, Shi-Rong Liu, Ti-Ger Dong, Gang Wang, and Cao-Jian Qin. "Annealing and Quenching Effect in the Localized States Emission on Nanosilicon Fabricated by Pulsed Laser." Optics Communications 342 (2015): 79. https://doi.org/10.1016/j.optcom.2014.12.041.

MLA (9th ed.) Citation

Huang, Wei-Qi, et al. "Annealing and Quenching Effect in the Localized States Emission on Nanosilicon Fabricated by Pulsed Laser." Optics Communications, vol. 342, 2015, p. 79, https://doi.org/10.1016/j.optcom.2014.12.041.