Innovative Nitride Passivated Pseudomorphic GaAs HEMTs.

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Title: Innovative Nitride Passivated Pseudomorphic GaAs HEMTs.
Authors: Chou, Y.C., Lai, R., Li, G.P., Jun Hua, Nam, P., Grundbacher, R., Kim, H.K., Ra, Y., Biedenbender, M., Ahlers, E., Barsky, M., Oki, A., Streit, D.
Source: IEEE Electron Device Letters. Jan2003, Vol. 24 Issue 1, p7. 3p. 5 Graphs.
Subjects: Integrated circuit passivation, Modulation-doped field-effect transistors, Nitrides
Abstract: Develops a novel low-temperature nitride passivation technique using high-density inductively coupled plasma chemical vapor deposition (HD-ICP-CVD) to passivate 0.15 micrometer pseudomorphic GaAs high-electron mobility transistors. Higher density and lower hydrogen concentration of HD-ICP-CVD nitrides; Exhibition of better performance in reverse breakdown voltage and transconductance.
Database: Engineering Source
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Header DbId: egs
DbLabel: Engineering Source
An: 10168492
AccessLevel: 6
PubType: Academic Journal
PubTypeId: academicJournal
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  Data: Innovative Nitride Passivated Pseudomorphic GaAs HEMTs.
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  Data: <searchLink fieldCode="AR" term="%22Chou%2C+Y%2EC%2E%22">Chou, Y.C.</searchLink><br /><searchLink fieldCode="AR" term="%22Lai%2C+R%2E%22">Lai, R.</searchLink><br /><searchLink fieldCode="AR" term="%22Li%2C+G%2EP%2E%22">Li, G.P.</searchLink><br /><searchLink fieldCode="AR" term="%22Jun+Hua%22">Jun Hua</searchLink><br /><searchLink fieldCode="AR" term="%22Nam%2C+P%2E%22">Nam, P.</searchLink><br /><searchLink fieldCode="AR" term="%22Grundbacher%2C+R%2E%22">Grundbacher, R.</searchLink><br /><searchLink fieldCode="AR" term="%22Kim%2C+H%2EK%2E%22">Kim, H.K.</searchLink><br /><searchLink fieldCode="AR" term="%22Ra%2C+Y%2E%22">Ra, Y.</searchLink><br /><searchLink fieldCode="AR" term="%22Biedenbender%2C+M%2E%22">Biedenbender, M.</searchLink><br /><searchLink fieldCode="AR" term="%22Ahlers%2C+E%2E%22">Ahlers, E.</searchLink><br /><searchLink fieldCode="AR" term="%22Barsky%2C+M%2E%22">Barsky, M.</searchLink><br /><searchLink fieldCode="AR" term="%22Oki%2C+A%2E%22">Oki, A.</searchLink><br /><searchLink fieldCode="AR" term="%22Streit%2C+D%2E%22">Streit, D.</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22IEEE+Electron+Device+Letters%22">IEEE Electron Device Letters</searchLink>. Jan2003, Vol. 24 Issue 1, p7. 3p. 5 Graphs.
– Name: Subject
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  Group: Su
  Data: <searchLink fieldCode="DE" term="%22Integrated+circuit+passivation%22">Integrated circuit passivation</searchLink><br /><searchLink fieldCode="DE" term="%22Modulation-doped+field-effect+transistors%22">Modulation-doped field-effect transistors</searchLink><br /><searchLink fieldCode="DE" term="%22Nitrides%22">Nitrides</searchLink>
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  Label: Abstract
  Group: Ab
  Data: Develops a novel low-temperature nitride passivation technique using high-density inductively coupled plasma chemical vapor deposition (HD-ICP-CVD) to passivate 0.15 micrometer pseudomorphic GaAs high-electron mobility transistors. Higher density and lower hydrogen concentration of HD-ICP-CVD nitrides; Exhibition of better performance in reverse breakdown voltage and transconductance.
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RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1109/LED.2002.807313
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      – Code: eng
        Text: English
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        PageCount: 3
        StartPage: 7
    Subjects:
      – SubjectFull: Integrated circuit passivation
        Type: general
      – SubjectFull: Modulation-doped field-effect transistors
        Type: general
      – SubjectFull: Nitrides
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              Text: Jan2003
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              Y: 2003
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