Bollani, M., Müller, E., Signoretti, S., Beeli, C., Isella, G., Kummer, M., & von Känel, H. (2003). Compressively strained Ge channels on relaxed SiGe buffer layers. Materials Science & Engineering: B, 101(1-3), 102. https://doi.org/10.1016/S0921-5107(02)00662-1
Chicago Style (17th ed.) CitationBollani, M., E. Müller, S. Signoretti, C. Beeli, G. Isella, M. Kummer, and H. von Känel. "Compressively Strained Ge Channels on Relaxed SiGe Buffer Layers." Materials Science & Engineering: B 101, no. 1-3 (2003): 102. https://doi.org/10.1016/S0921-5107(02)00662-1.
MLA (9th ed.) CitationBollani, M., et al. "Compressively Strained Ge Channels on Relaxed SiGe Buffer Layers." Materials Science & Engineering: B, vol. 101, no. 1-3, 2003, p. 102, https://doi.org/10.1016/S0921-5107(02)00662-1.