Application of plasma deposited organosilicon thin films for the corrosion protection of metals
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| Title: | Application of plasma deposited organosilicon thin films for the corrosion protection of metals |
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| Authors: | Fracassi, F.1 fracassi@chimica.uniba.it, d'Agostino, R.1, Palumbo, F.1, Angelini, E.2, Grassini, S.2, Rosalbino, F.2 |
| Source: | Surface & Coatings Technology. Sep/Oct2003, Vol. 174-175, p107. 5p. |
| Subjects: | Chemical vapor deposition, Silicon, Organic compounds, Thin films |
| Abstract: | In this contribution it will be shown that plasma enhanced chemical vapor deposition (PECVD) of silicon containing organic compounds is a promising approach for the corrosion protection of metals (steel and magnesium alloys). When the deposition process is preceded by a suitable plasma treatment, which depends on the particular metal under study, a marked increase of the protective properties measured with electrochemical impedance spectroscopy (EIS) is detected. The highest impedance modulus obtained for Mg is 450 KΩ·cm2, 8000 times higher than for the bare metal. Highly protective coatings are obtained for inorganic films, free of sylanols. A marked decrease of the impedance modulus of coated substrates has been registered after immersion in electrolyte solution due to the presence of pinholes which represents defect points where localized corrosion starts. [Copyright &y& Elsevier] |
| Copyright of Surface & Coatings Technology is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.) | |
| Database: | Engineering Source |
| FullText | Text: Availability: 0 |
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| Header | DbId: egs DbLabel: Engineering Source An: 10575649 AccessLevel: 6 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: Application of plasma deposited organosilicon thin films for the corrosion protection of metals – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AR" term="%22Fracassi%2C+F%2E%22">Fracassi, F.</searchLink><relatesTo>1</relatesTo><i> fracassi@chimica.uniba.it</i><br /><searchLink fieldCode="AR" term="%22d'Agostino%2C+R%2E%22">d'Agostino, R.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Palumbo%2C+F%2E%22">Palumbo, F.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Angelini%2C+E%2E%22">Angelini, E.</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AR" term="%22Grassini%2C+S%2E%22">Grassini, S.</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AR" term="%22Rosalbino%2C+F%2E%22">Rosalbino, F.</searchLink><relatesTo>2</relatesTo> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Surface+%26+Coatings+Technology%22">Surface & Coatings Technology</searchLink>. Sep/Oct2003, Vol. 174-175, p107. 5p. – Name: Subject Label: Subjects Group: Su Data: <searchLink fieldCode="DE" term="%22Chemical+vapor+deposition%22">Chemical vapor deposition</searchLink><br /><searchLink fieldCode="DE" term="%22Silicon%22">Silicon</searchLink><br /><searchLink fieldCode="DE" term="%22Organic+compounds%22">Organic compounds</searchLink><br /><searchLink fieldCode="DE" term="%22Thin+films%22">Thin films</searchLink> – Name: Abstract Label: Abstract Group: Ab Data: In this contribution it will be shown that plasma enhanced chemical vapor deposition (PECVD) of silicon containing organic compounds is a promising approach for the corrosion protection of metals (steel and magnesium alloys). When the deposition process is preceded by a suitable plasma treatment, which depends on the particular metal under study, a marked increase of the protective properties measured with electrochemical impedance spectroscopy (EIS) is detected. The highest impedance modulus obtained for Mg is 450 KΩ·cm2, 8000 times higher than for the bare metal. Highly protective coatings are obtained for inorganic films, free of sylanols. A marked decrease of the impedance modulus of coated substrates has been registered after immersion in electrolyte solution due to the presence of pinholes which represents defect points where localized corrosion starts. [Copyright &y& Elsevier] – Name: AbstractSuppliedCopyright Label: Group: Ab Data: <i>Copyright of Surface & Coatings Technology is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.) |
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| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1016/S0257-8972(03)00422-5 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 5 StartPage: 107 Subjects: – SubjectFull: Chemical vapor deposition Type: general – SubjectFull: Silicon Type: general – SubjectFull: Organic compounds Type: general – SubjectFull: Thin films Type: general Titles: – TitleFull: Application of plasma deposited organosilicon thin films for the corrosion protection of metals Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Fracassi, F. – PersonEntity: Name: NameFull: d'Agostino, R. – PersonEntity: Name: NameFull: Palumbo, F. – PersonEntity: Name: NameFull: Angelini, E. – PersonEntity: Name: NameFull: Grassini, S. – PersonEntity: Name: NameFull: Rosalbino, F. IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 09 Text: Sep/Oct2003 Type: published Y: 2003 Identifiers: – Type: issn-print Value: 02578972 Numbering: – Type: volume Value: 174-175 Titles: – TitleFull: Surface & Coatings Technology Type: main |
| ResultId | 1 |
