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X-ray diffuse scattering investigation of thin films

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Title: X-ray diffuse scattering investigation of thin films
Authors: Logothetidis, S. logot@auth.gr, Panayiotatos, Y.1, Gravalidis, C.1, Patsalas, P.1, Zoy, A.1
Source: Materials Science & Engineering: B. Sep2003, Vol. 102 Issue 1-3, p25. 5p.
Subjects: X-ray scattering, Nanoparticles, Thin films
Abstract: X-ray Diffuse Scattering (XDS) is presented, a technique, which determines the roughness, morphology and nanoparticle distribution of thin films. XDS is complementary to X-ray Diffraction and Reflectivity (XRD–XRR). The ability of XDS is demonstrated to investigate the films’ nanoscale surface structure and to determine additional geometrical features such as correlation length and fractal characteristics. It is shown that XDS can be used for the study of the surface morphology, as well as, phase identification of amorphous materials and combined with XRR for quantitative analysis of composite films using the Distorted Wave Born Approximation (DWBA) with the concept that the film surface behaves like a Self-Affined medium. As model systems we study nanocrystalline Boron Nitride (BN) and amorphous Carbon (a-C) films. XDS spectra of BN films containing both cubic and hexagonal phases exhibit two set of Yoneda peaks, located at angles characteristic of the corresponding BN densities, while BN films containing only hexagonal phase exhibit one characteristic set. This indicates that the two BN phases are not atomically mixed. The opposite: strong atomical mixture of sp2 and sp3 components, was found in a-C films by XDS. Additionally, the growth mechanism for a-C films deposited with or without ion bombardment assistance is predicted and discussed. [Copyright &y& Elsevier]
Copyright of Materials Science & Engineering: B is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database: Engineering Source
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Header DbId: egs
DbLabel: Engineering Source
An: 10635055
AccessLevel: 6
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: X-ray diffuse scattering investigation of thin films
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  Data: <searchLink fieldCode="AR" term="%22Logothetidis%2C+S%2E%22">Logothetidis, S.</searchLink><i> logot@auth.gr</i><br /><searchLink fieldCode="AR" term="%22Panayiotatos%2C+Y%2E%22">Panayiotatos, Y.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Gravalidis%2C+C%2E%22">Gravalidis, C.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Patsalas%2C+P%2E%22">Patsalas, P.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Zoy%2C+A%2E%22">Zoy, A.</searchLink><relatesTo>1</relatesTo>
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  Data: <searchLink fieldCode="JN" term="%22Materials+Science+%26+Engineering%3A+B%22">Materials Science & Engineering: B</searchLink>. Sep2003, Vol. 102 Issue 1-3, p25. 5p.
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  Data: <searchLink fieldCode="DE" term="%22X-ray+scattering%22">X-ray scattering</searchLink><br /><searchLink fieldCode="DE" term="%22Nanoparticles%22">Nanoparticles</searchLink><br /><searchLink fieldCode="DE" term="%22Thin+films%22">Thin films</searchLink>
– Name: Abstract
  Label: Abstract
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  Data: X-ray Diffuse Scattering (XDS) is presented, a technique, which determines the roughness, morphology and nanoparticle distribution of thin films. XDS is complementary to X-ray Diffraction and Reflectivity (XRD–XRR). The ability of XDS is demonstrated to investigate the films’ nanoscale surface structure and to determine additional geometrical features such as correlation length and fractal characteristics. It is shown that XDS can be used for the study of the surface morphology, as well as, phase identification of amorphous materials and combined with XRR for quantitative analysis of composite films using the Distorted Wave Born Approximation (DWBA) with the concept that the film surface behaves like a Self-Affined medium. As model systems we study nanocrystalline Boron Nitride (BN) and amorphous Carbon (a-C) films. XDS spectra of BN films containing both cubic and hexagonal phases exhibit two set of Yoneda peaks, located at angles characteristic of the corresponding BN densities, while BN films containing only hexagonal phase exhibit one characteristic set. This indicates that the two BN phases are not atomically mixed. The opposite: strong atomical mixture of sp2 and sp3 components, was found in a-C films by XDS. Additionally, the growth mechanism for a-C films deposited with or without ion bombardment assistance is predicted and discussed. [Copyright &y& Elsevier]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Materials Science & Engineering: B is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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      – Type: doi
        Value: 10.1016/S0921-5107(02)00746-8
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      – Code: eng
        Text: English
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        PageCount: 5
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      – SubjectFull: X-ray scattering
        Type: general
      – SubjectFull: Nanoparticles
        Type: general
      – SubjectFull: Thin films
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              M: 09
              Text: Sep2003
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              Y: 2003
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