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Investigation of the utility of cellulose acetate butyrate in minimal residue graphene transfer, lithography, and plasma treatments.

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Title: Investigation of the utility of cellulose acetate butyrate in minimal residue graphene transfer, lithography, and plasma treatments.
Authors: Burwell, Gregory1 G.Burwell@swansea.ac.uk, Smith, Nathan2, Guy, Owen1
Source: Microelectronic Engineering. Oct2015, Vol. 146, p81-84. 4p.
Subjects: Cellulose acetate, Butyrates, Graphene, Fourier transform infrared spectroscopy, Substrates (Materials science)
Abstract: Residues on graphene substrates from polymer-supported transfer and lithography can significantly degrade device performance. Using Fourier transform infrared (FTIR), Raman spectroscopy and Auger electron spectroscopy (AES), cellulose acetate butyrate (CAB) dissolved in ethyl acetate is shown to leave minimal polymer residue on graphene after substrate transfer. The polymer can also be used as a protective under-layer between an electron beam resist and the graphene during electron beam lithography, as well as a protective over-layer during inductively coupled plasma (ICP) etching to slow the etch rate of graphene and remove protruding polymer residues without etching the underlying graphene. CAB is therefore shown to be a useful material for the handling and processing of graphene. [ABSTRACT FROM AUTHOR]
Copyright of Microelectronic Engineering is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database: Engineering Source
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DbLabel: Engineering Source
An: 109087517
AccessLevel: 6
PubType: Academic Journal
PubTypeId: academicJournal
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  Data: Investigation of the utility of cellulose acetate butyrate in minimal residue graphene transfer, lithography, and plasma treatments.
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  Data: <searchLink fieldCode="AR" term="%22Burwell%2C+Gregory%22">Burwell, Gregory</searchLink><relatesTo>1</relatesTo><i> G.Burwell@swansea.ac.uk</i><br /><searchLink fieldCode="AR" term="%22Smith%2C+Nathan%22">Smith, Nathan</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AR" term="%22Guy%2C+Owen%22">Guy, Owen</searchLink><relatesTo>1</relatesTo>
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  Data: <searchLink fieldCode="JN" term="%22Microelectronic+Engineering%22">Microelectronic Engineering</searchLink>. Oct2015, Vol. 146, p81-84. 4p.
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  Data: <searchLink fieldCode="DE" term="%22Cellulose+acetate%22">Cellulose acetate</searchLink><br /><searchLink fieldCode="DE" term="%22Butyrates%22">Butyrates</searchLink><br /><searchLink fieldCode="DE" term="%22Graphene%22">Graphene</searchLink><br /><searchLink fieldCode="DE" term="%22Fourier+transform+infrared+spectroscopy%22">Fourier transform infrared spectroscopy</searchLink><br /><searchLink fieldCode="DE" term="%22Substrates+%28Materials+science%29%22">Substrates (Materials science)</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: Residues on graphene substrates from polymer-supported transfer and lithography can significantly degrade device performance. Using Fourier transform infrared (FTIR), Raman spectroscopy and Auger electron spectroscopy (AES), cellulose acetate butyrate (CAB) dissolved in ethyl acetate is shown to leave minimal polymer residue on graphene after substrate transfer. The polymer can also be used as a protective under-layer between an electron beam resist and the graphene during electron beam lithography, as well as a protective over-layer during inductively coupled plasma (ICP) etching to slow the etch rate of graphene and remove protruding polymer residues without etching the underlying graphene. CAB is therefore shown to be a useful material for the handling and processing of graphene. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Microelectronic Engineering is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1016/j.mee.2015.04.097
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      – Code: eng
        Text: English
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        PageCount: 4
        StartPage: 81
    Subjects:
      – SubjectFull: Cellulose acetate
        Type: general
      – SubjectFull: Butyrates
        Type: general
      – SubjectFull: Graphene
        Type: general
      – SubjectFull: Fourier transform infrared spectroscopy
        Type: general
      – SubjectFull: Substrates (Materials science)
        Type: general
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      – TitleFull: Investigation of the utility of cellulose acetate butyrate in minimal residue graphene transfer, lithography, and plasma treatments.
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              Text: Oct2015
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              Y: 2015
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              Value: 146
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