Effect of ion bombardment on the structural and optical properties of TiO2 thin films deposited from oxygen/titanium tetraisopropoxide inductively coupled plasma.
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| Title: | Effect of ion bombardment on the structural and optical properties of TiO2 thin films deposited from oxygen/titanium tetraisopropoxide inductively coupled plasma. |
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| Authors: | Li, D.1, Carette, M.2, Granier, A.2, Landesman, J.P.2, Goullet, A.2 antoine.goullet@univ-nantes.fr |
| Source: | Thin Solid Films. Aug2015, Vol. 589, p783-791. 9p. |
| Subjects: | Optical properties of titanium dioxide, Ion bombardment, Crystal structure, Thin films, Oxygen, Inductively coupled plasma spectrometry, Silicon |
| Abstract: | Titanium dioxide films were deposited on silicon substrates from oxygen/titanium tetraisopropoxide inductively coupled radiofrequency plasmas in a helicon reactor operated at low temperature (< 150 °C) and low pressure (0.4 Pa). The effect of the ion energy (E i ), varied in the 15–175 eV range, on the morphology, microstructure and optical properties of the films is investigated. Scanning electron microscopy (SEM) shows that at low energy (E i = 15 eV), the film exhibits a columnar morphology consisting of a bottom dense layer, an intermediate gradient layer and a top roughness layer. Increasing the ion energy results in more homogeneous films along the growth direction as confirmed by the in-situ kinetic ellipsometry measurements and post deposition spectroscopic ellipsometry data analysis. In addition, the atomic force microscopy (AFM) measurements reveal that the film top surface becomes smoother as E i is increased. X-ray diffraction (XRD) diagrams show that only anatase is identified in the film deposited at 15 eV, whereas the complete phase transformation from anatase to rutile occurs at E i = 75 eV. These results are in good agreement with the Fourier transform infrared spectroscopy (FTIR) spectra which also show that the hydroxyl groups absorbed in the films deposited at 15 eV, are greatly decreased for E i ≥ 45 eV. Suitable structural models combined with the Tauc–Lorentz dispersion law have been found to accurately fit the spectroscopic ellipsometry experimental data. The results in good agreement with SEM and AFM measurements are also consistent with the structural properties evidenced by XRD and FTIR. The refractive index (n) can be increased significantly by increasing the ion energy from 15 eV to 75 eV, reaching a value of 2.49 at 1.96 eV. Upon increasing the ion energy above 75 eV n is shown to decrease due to micropores which are formed in the films. [ABSTRACT FROM AUTHOR] |
| Copyright of Thin Solid Films is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.) | |
| Database: | Engineering Source |
| FullText | Text: Availability: 0 |
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| Header | DbId: egs DbLabel: Engineering Source An: 109104673 AccessLevel: 6 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: Effect of ion bombardment on the structural and optical properties of TiO2 thin films deposited from oxygen/titanium tetraisopropoxide inductively coupled plasma. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AR" term="%22Li%2C+D%2E%22">Li, D.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Carette%2C+M%2E%22">Carette, M.</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AR" term="%22Granier%2C+A%2E%22">Granier, A.</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AR" term="%22Landesman%2C+J%2EP%2E%22">Landesman, J.P.</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AR" term="%22Goullet%2C+A%2E%22">Goullet, A.</searchLink><relatesTo>2</relatesTo><i> antoine.goullet@univ-nantes.fr</i> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Thin+Solid+Films%22">Thin Solid Films</searchLink>. Aug2015, Vol. 589, p783-791. 9p. – Name: Subject Label: Subjects Group: Su Data: <searchLink fieldCode="DE" term="%22Optical+properties+of+titanium+dioxide%22">Optical properties of titanium dioxide</searchLink><br /><searchLink fieldCode="DE" term="%22Ion+bombardment%22">Ion bombardment</searchLink><br /><searchLink fieldCode="DE" term="%22Crystal+structure%22">Crystal structure</searchLink><br /><searchLink fieldCode="DE" term="%22Thin+films%22">Thin films</searchLink><br /><searchLink fieldCode="DE" term="%22Oxygen%22">Oxygen</searchLink><br /><searchLink fieldCode="DE" term="%22Inductively+coupled+plasma+spectrometry%22">Inductively coupled plasma spectrometry</searchLink><br /><searchLink fieldCode="DE" term="%22Silicon%22">Silicon</searchLink> – Name: Abstract Label: Abstract Group: Ab Data: Titanium dioxide films were deposited on silicon substrates from oxygen/titanium tetraisopropoxide inductively coupled radiofrequency plasmas in a helicon reactor operated at low temperature (< 150 °C) and low pressure (0.4 Pa). The effect of the ion energy (E i ), varied in the 15–175 eV range, on the morphology, microstructure and optical properties of the films is investigated. Scanning electron microscopy (SEM) shows that at low energy (E i = 15 eV), the film exhibits a columnar morphology consisting of a bottom dense layer, an intermediate gradient layer and a top roughness layer. Increasing the ion energy results in more homogeneous films along the growth direction as confirmed by the in-situ kinetic ellipsometry measurements and post deposition spectroscopic ellipsometry data analysis. In addition, the atomic force microscopy (AFM) measurements reveal that the film top surface becomes smoother as E i is increased. X-ray diffraction (XRD) diagrams show that only anatase is identified in the film deposited at 15 eV, whereas the complete phase transformation from anatase to rutile occurs at E i = 75 eV. These results are in good agreement with the Fourier transform infrared spectroscopy (FTIR) spectra which also show that the hydroxyl groups absorbed in the films deposited at 15 eV, are greatly decreased for E i ≥ 45 eV. Suitable structural models combined with the Tauc–Lorentz dispersion law have been found to accurately fit the spectroscopic ellipsometry experimental data. The results in good agreement with SEM and AFM measurements are also consistent with the structural properties evidenced by XRD and FTIR. The refractive index (n) can be increased significantly by increasing the ion energy from 15 eV to 75 eV, reaching a value of 2.49 at 1.96 eV. Upon increasing the ion energy above 75 eV n is shown to decrease due to micropores which are formed in the films. [ABSTRACT FROM AUTHOR] – Name: AbstractSuppliedCopyright Label: Group: Ab Data: <i>Copyright of Thin Solid Films is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.) |
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| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1016/j.tsf.2015.07.015 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 9 StartPage: 783 Subjects: – SubjectFull: Optical properties of titanium dioxide Type: general – SubjectFull: Ion bombardment Type: general – SubjectFull: Crystal structure Type: general – SubjectFull: Thin films Type: general – SubjectFull: Oxygen Type: general – SubjectFull: Inductively coupled plasma spectrometry Type: general – SubjectFull: Silicon Type: general Titles: – TitleFull: Effect of ion bombardment on the structural and optical properties of TiO2 thin films deposited from oxygen/titanium tetraisopropoxide inductively coupled plasma. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Li, D. – PersonEntity: Name: NameFull: Carette, M. – PersonEntity: Name: NameFull: Granier, A. – PersonEntity: Name: NameFull: Landesman, J.P. – PersonEntity: Name: NameFull: Goullet, A. IsPartOfRelationships: – BibEntity: Dates: – D: 31 M: 08 Text: Aug2015 Type: published Y: 2015 Identifiers: – Type: issn-print Value: 00406090 Numbering: – Type: volume Value: 589 Titles: – TitleFull: Thin Solid Films Type: main |
| ResultId | 1 |
