Monitoring of organic contamination in the ambient air of microelectronic clean room by proton-transfer reaction/time-of-flight/mass spectrometry (PTR–ToF–MS).
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| Title: | Monitoring of organic contamination in the ambient air of microelectronic clean room by proton-transfer reaction/time-of-flight/mass spectrometry (PTR–ToF–MS). |
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| Authors: | Hayeck, Nathalie1,2 nathalie.hayeck@etu.univ-amu.fr, Temime-Roussel, Brice1, Gligorovski, Sasho1, Mizzi, Aurélie1, Gemayel, Rachel1, Tlili, Sabrine1, Maillot, Philippe3, Pic, Nicolas3, Vitrani, Thomas3, Poulet, Irène2, Wortham, Henri1 |
| Source: | International Journal of Mass Spectrometry. Dec2015, Vol. 392, p102-110. 9p. |
| Subjects: | Air pollutants, Proton transfer reactions, Microelectronics, Clean rooms, Time-of-flight mass spectrometry, Photolithography |
| Abstract: | The organic contamination has been recently considered as the most important problem for the photolithography world in the semiconductor industry, especially when the photolithographic methods moved from 130 nm node to 32 nm node. One of the most common organic compounds found in photolithography areas of the clean room is Trimethylsilanol (TMS), which can adsorb on the optical lenses forming a thin molecular layer, hence causing damages. Salt crystal formation is another potential threat for the optical devices. In the clean rooms, this salt is produced by a light-induced reaction between ammonia and an acid. In the context of semiconductor industry, the involved acid is usually the acetic acid produced by hydrolysis from propylene glycol methyl ether acetate (PGMEA), a commonly used organic compound in the photolithography. Here, we present an innovative analytical method using a state-of-the-art proton-transfer reaction–time-of-flight–mass spectrometer (PTR–ToF–MS) for on-line and continuous survey of volatile organic compounds (VOCs) with an emphasis on TMS and PGMEA. The effect of relative humidity on the detection and fragmentation of these organic compounds was assessed. The new analytical method is operated in a real life clean room environment and the results were compared with those obtained with off-line measurements using automated thermal desorber–gas chromatography–mass spectrometry (ATD–GC–MS) as reference method. The contamination sources were detected and identified, which is of paramount importance for the microelectronic fabrication plant. The trapping efficiency of the chemical filters used for AMCs filtration in the photolithography zone was determined. [ABSTRACT FROM AUTHOR] |
| Copyright of International Journal of Mass Spectrometry is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.) | |
| Database: | Engineering Source |
| FullText | Text: Availability: 0 |
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| Header | DbId: egs DbLabel: Engineering Source An: 111057247 AccessLevel: 6 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: Monitoring of organic contamination in the ambient air of microelectronic clean room by proton-transfer reaction/time-of-flight/mass spectrometry (PTR–ToF–MS). – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AR" term="%22Hayeck%2C+Nathalie%22">Hayeck, Nathalie</searchLink><relatesTo>1,2</relatesTo><i> nathalie.hayeck@etu.univ-amu.fr</i><br /><searchLink fieldCode="AR" term="%22Temime-Roussel%2C+Brice%22">Temime-Roussel, Brice</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Gligorovski%2C+Sasho%22">Gligorovski, Sasho</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Mizzi%2C+Aurélie%22">Mizzi, Aurélie</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Gemayel%2C+Rachel%22">Gemayel, Rachel</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Tlili%2C+Sabrine%22">Tlili, Sabrine</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Maillot%2C+Philippe%22">Maillot, Philippe</searchLink><relatesTo>3</relatesTo><br /><searchLink fieldCode="AR" term="%22Pic%2C+Nicolas%22">Pic, Nicolas</searchLink><relatesTo>3</relatesTo><br /><searchLink fieldCode="AR" term="%22Vitrani%2C+Thomas%22">Vitrani, Thomas</searchLink><relatesTo>3</relatesTo><br /><searchLink fieldCode="AR" term="%22Poulet%2C+Irène%22">Poulet, Irène</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AR" term="%22Wortham%2C+Henri%22">Wortham, Henri</searchLink><relatesTo>1</relatesTo> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22International+Journal+of+Mass+Spectrometry%22">International Journal of Mass Spectrometry</searchLink>. Dec2015, Vol. 392, p102-110. 9p. – Name: Subject Label: Subjects Group: Su Data: <searchLink fieldCode="DE" term="%22Air+pollutants%22">Air pollutants</searchLink><br /><searchLink fieldCode="DE" term="%22Proton+transfer+reactions%22">Proton transfer reactions</searchLink><br /><searchLink fieldCode="DE" term="%22Microelectronics%22">Microelectronics</searchLink><br /><searchLink fieldCode="DE" term="%22Clean+rooms%22">Clean rooms</searchLink><br /><searchLink fieldCode="DE" term="%22Time-of-flight+mass+spectrometry%22">Time-of-flight mass spectrometry</searchLink><br /><searchLink fieldCode="DE" term="%22Photolithography%22">Photolithography</searchLink> – Name: Abstract Label: Abstract Group: Ab Data: The organic contamination has been recently considered as the most important problem for the photolithography world in the semiconductor industry, especially when the photolithographic methods moved from 130 nm node to 32 nm node. One of the most common organic compounds found in photolithography areas of the clean room is Trimethylsilanol (TMS), which can adsorb on the optical lenses forming a thin molecular layer, hence causing damages. Salt crystal formation is another potential threat for the optical devices. In the clean rooms, this salt is produced by a light-induced reaction between ammonia and an acid. In the context of semiconductor industry, the involved acid is usually the acetic acid produced by hydrolysis from propylene glycol methyl ether acetate (PGMEA), a commonly used organic compound in the photolithography. Here, we present an innovative analytical method using a state-of-the-art proton-transfer reaction–time-of-flight–mass spectrometer (PTR–ToF–MS) for on-line and continuous survey of volatile organic compounds (VOCs) with an emphasis on TMS and PGMEA. The effect of relative humidity on the detection and fragmentation of these organic compounds was assessed. The new analytical method is operated in a real life clean room environment and the results were compared with those obtained with off-line measurements using automated thermal desorber–gas chromatography–mass spectrometry (ATD–GC–MS) as reference method. The contamination sources were detected and identified, which is of paramount importance for the microelectronic fabrication plant. The trapping efficiency of the chemical filters used for AMCs filtration in the photolithography zone was determined. [ABSTRACT FROM AUTHOR] – Name: AbstractSuppliedCopyright Label: Group: Ab Data: <i>Copyright of International Journal of Mass Spectrometry is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.) |
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| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1016/j.ijms.2015.09.017 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 9 StartPage: 102 Subjects: – SubjectFull: Air pollutants Type: general – SubjectFull: Proton transfer reactions Type: general – SubjectFull: Microelectronics Type: general – SubjectFull: Clean rooms Type: general – SubjectFull: Time-of-flight mass spectrometry Type: general – SubjectFull: Photolithography Type: general Titles: – TitleFull: Monitoring of organic contamination in the ambient air of microelectronic clean room by proton-transfer reaction/time-of-flight/mass spectrometry (PTR–ToF–MS). Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Hayeck, Nathalie – PersonEntity: Name: NameFull: Temime-Roussel, Brice – PersonEntity: Name: NameFull: Gligorovski, Sasho – PersonEntity: Name: NameFull: Mizzi, Aurélie – PersonEntity: Name: NameFull: Gemayel, Rachel – PersonEntity: Name: NameFull: Tlili, Sabrine – PersonEntity: Name: NameFull: Maillot, Philippe – PersonEntity: Name: NameFull: Pic, Nicolas – PersonEntity: Name: NameFull: Vitrani, Thomas – PersonEntity: Name: NameFull: Poulet, Irène – PersonEntity: Name: NameFull: Wortham, Henri IsPartOfRelationships: – BibEntity: Dates: – D: 03 M: 12 Text: Dec2015 Type: published Y: 2015 Identifiers: – Type: issn-print Value: 13873806 Numbering: – Type: volume Value: 392 Titles: – TitleFull: International Journal of Mass Spectrometry Type: main |
| ResultId | 1 |
