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Optical waveguides fabricated by nitrogen ion implantation in fused silica.

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Title: Optical waveguides fabricated by nitrogen ion implantation in fused silica.
Authors: Chun-Xiao Liu1 cxliuopt@163.com, Li-Li Fu2, Rui-Lin Zheng1, Hai-Tao Guo3, Zhi-Guang Zhou3, Wei-Nan Li3, She-Bao Lin4, Wei Wei1 weiwei@njupt.edu.cn
Source: Optical Engineering. Feb2016, Vol. 55 Issue 2, p1-5. 5p.
Subjects: Optical waveguides, Integrated optics, Ion implantation, Ion bombardment, Fused silica
Abstract: We report on the fabrication of waveguides in fused silica using 4.5-MeV nitrogen ion implantation with a fluence of 5.0 x 1014 ions/cm². The prism-coupling method was employed to measure the effective refractive indices of guiding modes at the wavelengths of 632.8 and 1539 nm. The effective refractive indices of the first few modes were higher than that of the substrate. The refractive index profiles at 632.8 and 1539 nm were reconstructed by the reflectivity calculation method. Positive index changes were induced in the waveguide layers. The end-face coupling method was used to measure the near-field light intensity distributions at the wavelength of 632.8 nm and the finite-difference beam propagation method was applied to simulate the guided mode profile at the wavelength of 1539 nm. The waveguide structures emerge as candidates for integrated photonic devices. [ABSTRACT FROM AUTHOR]
Copyright of Optical Engineering is the property of SPIE - International Society of Optical Engineering and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database: Engineering Source
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Header DbId: egs
DbLabel: Engineering Source
An: 113493192
AccessLevel: 6
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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Items – Name: Title
  Label: Title
  Group: Ti
  Data: Optical waveguides fabricated by nitrogen ion implantation in fused silica.
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  Data: <searchLink fieldCode="AR" term="%22Chun-Xiao+Liu%22">Chun-Xiao Liu</searchLink><relatesTo>1</relatesTo><i> cxliuopt@163.com</i><br /><searchLink fieldCode="AR" term="%22Li-Li+Fu%22">Li-Li Fu</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AR" term="%22Rui-Lin+Zheng%22">Rui-Lin Zheng</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Hai-Tao+Guo%22">Hai-Tao Guo</searchLink><relatesTo>3</relatesTo><br /><searchLink fieldCode="AR" term="%22Zhi-Guang+Zhou%22">Zhi-Guang Zhou</searchLink><relatesTo>3</relatesTo><br /><searchLink fieldCode="AR" term="%22Wei-Nan+Li%22">Wei-Nan Li</searchLink><relatesTo>3</relatesTo><br /><searchLink fieldCode="AR" term="%22She-Bao+Lin%22">She-Bao Lin</searchLink><relatesTo>4</relatesTo><br /><searchLink fieldCode="AR" term="%22Wei+Wei%22">Wei Wei</searchLink><relatesTo>1</relatesTo><i> weiwei@njupt.edu.cn</i>
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  Data: <searchLink fieldCode="JN" term="%22Optical+Engineering%22">Optical Engineering</searchLink>. Feb2016, Vol. 55 Issue 2, p1-5. 5p.
– Name: Subject
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  Data: <searchLink fieldCode="DE" term="%22Optical+waveguides%22">Optical waveguides</searchLink><br /><searchLink fieldCode="DE" term="%22Integrated+optics%22">Integrated optics</searchLink><br /><searchLink fieldCode="DE" term="%22Ion+implantation%22">Ion implantation</searchLink><br /><searchLink fieldCode="DE" term="%22Ion+bombardment%22">Ion bombardment</searchLink><br /><searchLink fieldCode="DE" term="%22Fused+silica%22">Fused silica</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: We report on the fabrication of waveguides in fused silica using 4.5-MeV nitrogen ion implantation with a fluence of 5.0 x 1014 ions/cm². The prism-coupling method was employed to measure the effective refractive indices of guiding modes at the wavelengths of 632.8 and 1539 nm. The effective refractive indices of the first few modes were higher than that of the substrate. The refractive index profiles at 632.8 and 1539 nm were reconstructed by the reflectivity calculation method. Positive index changes were induced in the waveguide layers. The end-face coupling method was used to measure the near-field light intensity distributions at the wavelength of 632.8 nm and the finite-difference beam propagation method was applied to simulate the guided mode profile at the wavelength of 1539 nm. The waveguide structures emerge as candidates for integrated photonic devices. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Optical Engineering is the property of SPIE - International Society of Optical Engineering and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1117/1.OE.55.2.027105
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      – Code: eng
        Text: English
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        PageCount: 5
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    Subjects:
      – SubjectFull: Optical waveguides
        Type: general
      – SubjectFull: Integrated optics
        Type: general
      – SubjectFull: Ion implantation
        Type: general
      – SubjectFull: Ion bombardment
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      – SubjectFull: Fused silica
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              Text: Feb2016
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              Y: 2016
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