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Three-dimensional patterning in polymer optical waveguides using focused ion beam milling.

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Title: Three-dimensional patterning in polymer optical waveguides using focused ion beam milling.
Authors: Kruse, Kevin1, Burrell, Derek1, Middlebrook, Christopher1 ctmiddle@mtu.edu
Source: Journal of Micro/Nanolithography, MEMS & MOEMS. Jul2016, Vol. 15 Issue 3, p034505-1-034505-7. 7p.
Subjects: Three-dimensional imaging, Polymers, Optical waveguides, Ion beams, Single-mode optical fibers
Abstract: Waveguide (WG) photonic-bridge taper modules are designed for symmetric planar coupling between silicon WGs and single-mode fibers (SMFs) to minimize photonic chip and packaging footprint requirements with improving broadband functionality. Micromachined fabrication and evaluation of polymer WG tapers utilizing high-resolution focused ion beam (FIB) milling is performed and presented. Polymer etch rates utilizing the FIB and optimal methods for milling polymer tapers are identified for three-dimensional patterning. Polymer WG tapers with low sidewall roughness are manufactured utilizing FIB milling and optically tested for fabrication loss. FIB platforms utilize a focused beam of ions (Ga+) to etch submicron patterns into substrates. Fabricating low-loss polymer WG taper prototypes with the FIB before moving on to mass-production techniques provides theoretical understanding of the polymer taper and its feasibility for connectorization devices between silicon WGs and SMFs. [ABSTRACT FROM AUTHOR]
Copyright of Journal of Micro/Nanolithography, MEMS & MOEMS is the property of SPIE - International Society of Optical Engineering and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database: Engineering Source
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Header DbId: egs
DbLabel: Engineering Source
An: 118204899
AccessLevel: 6
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Three-dimensional patterning in polymer optical waveguides using focused ion beam milling.
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  Data: <searchLink fieldCode="AR" term="%22Kruse%2C+Kevin%22">Kruse, Kevin</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Burrell%2C+Derek%22">Burrell, Derek</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Middlebrook%2C+Christopher%22">Middlebrook, Christopher</searchLink><relatesTo>1</relatesTo><i> ctmiddle@mtu.edu</i>
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  Data: <searchLink fieldCode="DE" term="%22Three-dimensional+imaging%22">Three-dimensional imaging</searchLink><br /><searchLink fieldCode="DE" term="%22Polymers%22">Polymers</searchLink><br /><searchLink fieldCode="DE" term="%22Optical+waveguides%22">Optical waveguides</searchLink><br /><searchLink fieldCode="DE" term="%22Ion+beams%22">Ion beams</searchLink><br /><searchLink fieldCode="DE" term="%22Single-mode+optical+fibers%22">Single-mode optical fibers</searchLink>
– Name: Abstract
  Label: Abstract
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  Data: Waveguide (WG) photonic-bridge taper modules are designed for symmetric planar coupling between silicon WGs and single-mode fibers (SMFs) to minimize photonic chip and packaging footprint requirements with improving broadband functionality. Micromachined fabrication and evaluation of polymer WG tapers utilizing high-resolution focused ion beam (FIB) milling is performed and presented. Polymer etch rates utilizing the FIB and optimal methods for milling polymer tapers are identified for three-dimensional patterning. Polymer WG tapers with low sidewall roughness are manufactured utilizing FIB milling and optically tested for fabrication loss. FIB platforms utilize a focused beam of ions (Ga+) to etch submicron patterns into substrates. Fabricating low-loss polymer WG taper prototypes with the FIB before moving on to mass-production techniques provides theoretical understanding of the polymer taper and its feasibility for connectorization devices between silicon WGs and SMFs. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Journal of Micro/Nanolithography, MEMS & MOEMS is the property of SPIE - International Society of Optical Engineering and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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RecordInfo BibRecord:
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    Identifiers:
      – Type: doi
        Value: 10.1117/1.JMM.15.3.034505
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      – Code: eng
        Text: English
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      Pagination:
        PageCount: 7
        StartPage: 034505-1
    Subjects:
      – SubjectFull: Three-dimensional imaging
        Type: general
      – SubjectFull: Polymers
        Type: general
      – SubjectFull: Optical waveguides
        Type: general
      – SubjectFull: Ion beams
        Type: general
      – SubjectFull: Single-mode optical fibers
        Type: general
    Titles:
      – TitleFull: Three-dimensional patterning in polymer optical waveguides using focused ion beam milling.
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            NameFull: Kruse, Kevin
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            NameFull: Burrell, Derek
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            NameFull: Middlebrook, Christopher
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            – D: 01
              M: 07
              Text: Jul2016
              Type: published
              Y: 2016
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              Value: 15
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              Value: 3
          Titles:
            – TitleFull: Journal of Micro/Nanolithography, MEMS & MOEMS
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