View in EDS

Sputtering of carbon using hydrogen ion beams with energies of 60–800 eV.

Saved in:
Bibliographic Details
Title: Sputtering of carbon using hydrogen ion beams with energies of 60–800 eV.
Authors: Sidorov, Dmitry S.1 dmitrisidoroff@rambler.ru, Chkhalo, Nikolay I.2 chkhalo@ipm.sci-nnov.ru, Mikhailenko, Mikhail S.2, Pestov, Alexey E.2, Polkovnikov, Vladimir N.2
Source: Nuclear Instruments & Methods in Physics Research Section B. Nov2016, Vol. 387, p73-76. 4p.
Subjects: Hydrogen ions, Surface roughness, Sputtering (Physics), Carbon, Ion beams
Abstract: This article presents the result of a study on the sputtering of carbon films by low-energy hydrogen ions. In particular, the etching rate and surface roughness were measured. The range of energies where the sputtering switches from pure chemical to a combination of chemical and physical mechanisms was determined. It is shown that Sigmund’s theory for ion etching does not work well for fields of energy less than 150 eV and that it accurately describes the dependence of a sputtering coefficient on ion energy for energies greater than 300 eV. A strong smoothing effect for the surface of carbon film was also found. This result is interesting in itself and for its significance for the manufacture of super-smooth surfaces for X-ray applications. [ABSTRACT FROM AUTHOR]
Copyright of Nuclear Instruments & Methods in Physics Research Section B is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database: Engineering Source
FullText Text:
  Availability: 0
Header DbId: egs
DbLabel: Engineering Source
An: 119158432
AccessLevel: 6
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
IllustrationInfo
Items – Name: Title
  Label: Title
  Group: Ti
  Data: Sputtering of carbon using hydrogen ion beams with energies of 60–800 eV.
– Name: Author
  Label: Authors
  Group: Au
  Data: <searchLink fieldCode="AR" term="%22Sidorov%2C+Dmitry+S%2E%22">Sidorov, Dmitry S.</searchLink><relatesTo>1</relatesTo><i> dmitrisidoroff@rambler.ru</i><br /><searchLink fieldCode="AR" term="%22Chkhalo%2C+Nikolay+I%2E%22">Chkhalo, Nikolay I.</searchLink><relatesTo>2</relatesTo><i> chkhalo@ipm.sci-nnov.ru</i><br /><searchLink fieldCode="AR" term="%22Mikhailenko%2C+Mikhail+S%2E%22">Mikhailenko, Mikhail S.</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AR" term="%22Pestov%2C+Alexey+E%2E%22">Pestov, Alexey E.</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AR" term="%22Polkovnikov%2C+Vladimir+N%2E%22">Polkovnikov, Vladimir N.</searchLink><relatesTo>2</relatesTo>
– Name: TitleSource
  Label: Source
  Group: Src
  Data: <searchLink fieldCode="JN" term="%22Nuclear+Instruments+%26+Methods+in+Physics+Research+Section+B%22">Nuclear Instruments & Methods in Physics Research Section B</searchLink>. Nov2016, Vol. 387, p73-76. 4p.
– Name: Subject
  Label: Subjects
  Group: Su
  Data: <searchLink fieldCode="DE" term="%22Hydrogen+ions%22">Hydrogen ions</searchLink><br /><searchLink fieldCode="DE" term="%22Surface+roughness%22">Surface roughness</searchLink><br /><searchLink fieldCode="DE" term="%22Sputtering+%28Physics%29%22">Sputtering (Physics)</searchLink><br /><searchLink fieldCode="DE" term="%22Carbon%22">Carbon</searchLink><br /><searchLink fieldCode="DE" term="%22Ion+beams%22">Ion beams</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: This article presents the result of a study on the sputtering of carbon films by low-energy hydrogen ions. In particular, the etching rate and surface roughness were measured. The range of energies where the sputtering switches from pure chemical to a combination of chemical and physical mechanisms was determined. It is shown that Sigmund’s theory for ion etching does not work well for fields of energy less than 150 eV and that it accurately describes the dependence of a sputtering coefficient on ion energy for energies greater than 300 eV. A strong smoothing effect for the surface of carbon film was also found. This result is interesting in itself and for its significance for the manufacture of super-smooth surfaces for X-ray applications. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Nuclear Instruments & Methods in Physics Research Section B is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=egs&AN=119158432
RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1016/j.nimb.2016.10.007
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 4
        StartPage: 73
    Subjects:
      – SubjectFull: Hydrogen ions
        Type: general
      – SubjectFull: Surface roughness
        Type: general
      – SubjectFull: Sputtering (Physics)
        Type: general
      – SubjectFull: Carbon
        Type: general
      – SubjectFull: Ion beams
        Type: general
    Titles:
      – TitleFull: Sputtering of carbon using hydrogen ion beams with energies of 60–800 eV.
        Type: main
  BibRelationships:
    HasContributorRelationships:
      – PersonEntity:
          Name:
            NameFull: Sidorov, Dmitry S.
      – PersonEntity:
          Name:
            NameFull: Chkhalo, Nikolay I.
      – PersonEntity:
          Name:
            NameFull: Mikhailenko, Mikhail S.
      – PersonEntity:
          Name:
            NameFull: Pestov, Alexey E.
      – PersonEntity:
          Name:
            NameFull: Polkovnikov, Vladimir N.
    IsPartOfRelationships:
      – BibEntity:
          Dates:
            – D: 15
              M: 11
              Text: Nov2016
              Type: published
              Y: 2016
          Identifiers:
            – Type: issn-print
              Value: 0168583X
          Numbering:
            – Type: volume
              Value: 387
          Titles:
            – TitleFull: Nuclear Instruments & Methods in Physics Research Section B
              Type: main
ResultId 1