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Mechanisms of hydrophobization of polymeric composites etched in CF4 plasma.

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Title: Mechanisms of hydrophobization of polymeric composites etched in CF4 plasma.
Authors: Puliyalil, Harinarayanan1,2, Recek, Nina1,2, Filipič, Gregor1,2, Čekada, Miha1, Jerman, Ivan3, Mozetič, Miran1, Thomas, Sabu4, Cvelbar, Uroš1,2 uros.cvelbar@ijs.si
Source: Surface & Interface Analysis: SIA. Apr2017, Vol. 49 Issue 4, p334-339. 6p.
Subjects: Hydrophobic compounds, Fluorocarbons, Plasma etching, Polymeric composites, Plasma-enhanced chemical vapor deposition
Abstract: Achieving optimal hydrophobicity of polymer materials especially polymer-matrix composites is important for many material applications. Herein the interplay of factors determining hydrophobic surface is presented during CF4 plasma treatments which lead to functionalization as well as selective polymer-matrix etching. The continuous exposure to plasma reactive species induces functionalization and etching on the surface, which decides the surface morphology and surface chemistry. Consequently, exothermic processes during the plasma-surface interactions are another important factor which influences the surface chemistry and etching rate of the material. The results demonstrate that despite etching and increasing surface roughness, the major contribution to hydrophobic character is dependent on the number of carbon atoms populated with fluorine, whereas the temperature is a deciding factor for type of created bonds. Copyright © 2016 John Wiley & Sons, Ltd. [ABSTRACT FROM AUTHOR]
Copyright of Surface & Interface Analysis: SIA is the property of Wiley-Blackwell and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
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  Data: <searchLink fieldCode="DE" term="%22Hydrophobic+compounds%22">Hydrophobic compounds</searchLink><br /><searchLink fieldCode="DE" term="%22Fluorocarbons%22">Fluorocarbons</searchLink><br /><searchLink fieldCode="DE" term="%22Plasma+etching%22">Plasma etching</searchLink><br /><searchLink fieldCode="DE" term="%22Polymeric+composites%22">Polymeric composites</searchLink><br /><searchLink fieldCode="DE" term="%22Plasma-enhanced+chemical+vapor+deposition%22">Plasma-enhanced chemical vapor deposition</searchLink>
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  Data: Achieving optimal hydrophobicity of polymer materials especially polymer-matrix composites is important for many material applications. Herein the interplay of factors determining hydrophobic surface is presented during CF4 plasma treatments which lead to functionalization as well as selective polymer-matrix etching. The continuous exposure to plasma reactive species induces functionalization and etching on the surface, which decides the surface morphology and surface chemistry. Consequently, exothermic processes during the plasma-surface interactions are another important factor which influences the surface chemistry and etching rate of the material. The results demonstrate that despite etching and increasing surface roughness, the major contribution to hydrophobic character is dependent on the number of carbon atoms populated with fluorine, whereas the temperature is a deciding factor for type of created bonds. Copyright © 2016 John Wiley & Sons, Ltd. [ABSTRACT FROM AUTHOR]
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  Data: <i>Copyright of Surface & Interface Analysis: SIA is the property of Wiley-Blackwell and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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        Value: 10.1002/sia.6104
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        Text: English
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      – SubjectFull: Fluorocarbons
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      – SubjectFull: Plasma etching
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      – SubjectFull: Polymeric composites
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      – SubjectFull: Plasma-enhanced chemical vapor deposition
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              Text: Apr2017
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              Y: 2017
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