Photochemical Formation of Nitrite and Nitrous Acid (HONO) upon Irradiation of Nitrophenols in Aqueous Solution and in Viscous Secondary Organic Aerosol Proxy.
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| Title: | Photochemical Formation of Nitrite and Nitrous Acid (HONO) upon Irradiation of Nitrophenols in Aqueous Solution and in Viscous Secondary Organic Aerosol Proxy. |
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| Authors: | Barsotti, Francesco1, Bartels-Rausch, Thorsten2 thorsten.bartels-rausch@psi.ch, De Laurentiis, Elisa1, Ammann, Markus2, Brigante, Marcello3, Mailhot, Gilles3, Maurino, Valter1, Minero, Claudio1, Vione, Davide1,4 davide.vione@unito.it |
| Source: | Environmental Science & Technology. 7/5/2017, Vol. 51 Issue 13, p7486-7495. 10p. |
| Subjects: | Nitrates, Nitrophenols, Photochemistry |
| Abstract: | Irradiated nitrophenols can produce nitrite and nitrous acid (HONO) in bulk aqueous solutions and in viscous aqueous films, simulating the conditions of a high-solute-strength aqueous aerosol, with comparable quantum yields in solution and viscous films (10-5-10-4 in the case of 4-nitrophenol) and overall reaction yields up to 0.3 in solution. The process is particularly important for the para-nitrophenols, possibly because their less sterically hindered nitro groups can be released more easily as nitrite and HONO. The nitrophenols giving the highest photoproduction rates of nitrite and HONO (most notably, 4-nitrophenol and 2-methyl-4-nitrophenol) could significantly contribute to the occurrence of nitrite in aqueous phases in contact with the atmosphere. Interestingly, dew-water evaporation has shown potential to contribute to the gas-phase HONO levels during the morning, which accounts for the possible importance of the studied process. [ABSTRACT FROM AUTHOR] |
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| Database: | Engineering Source |
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