APA (7th ed.) Citation

Jiang, J., Mei, Q., Li, Y., & Liu, Y. (2017). Illumination system with freeform fly's eye to generate pixelated pupil prescribed by source-mask optimization in extreme ultraviolet lithography. Optical Engineering, 56(6), 1. https://doi.org/10.1117/1.OE.56.6.065101

Chicago Style (17th ed.) Citation

Jiang, Jiahua, Qiuli Mei, Yanqiu Li, and Yan Liu. "Illumination System with Freeform Fly's Eye to Generate Pixelated Pupil Prescribed by Source-mask Optimization in Extreme Ultraviolet Lithography." Optical Engineering 56, no. 6 (2017): 1. https://doi.org/10.1117/1.OE.56.6.065101.

MLA (9th ed.) Citation

Jiang, Jiahua, et al. "Illumination System with Freeform Fly's Eye to Generate Pixelated Pupil Prescribed by Source-mask Optimization in Extreme Ultraviolet Lithography." Optical Engineering, vol. 56, no. 6, 2017, p. 1, https://doi.org/10.1117/1.OE.56.6.065101.