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Illumination system with freeform fly's eye to generate pixelated pupil prescribed by source-mask optimization in extreme ultraviolet lithography.

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Title: Illumination system with freeform fly's eye to generate pixelated pupil prescribed by source-mask optimization in extreme ultraviolet lithography.
Authors: Jiahua Jiang1, Qiuli Mei1, Yanqiu Li1 liyanqiu@bit.edu.cn, Yan Liu1
Source: Optical Engineering. Jun2017, Vol. 56 Issue 6, p1-5. 5p.
Subjects: Ultraviolet lithography, Lithography techniques
Abstract: Source-mask optimization (SMO) has emerged as a key technique for 7-nm node and beyond in extreme ultraviolet (EUV) lithography. The pupil required by SMO is usually pixelated, with a free choice of intensity per pixel. However, due to the discrete nature of the EUV illumination system, pupil intensity in current EUV SMO must also be discretized. An illumination system with a freeform fly's eye that is able to generate the pixelated pupil is proposed. Clear apertures of the field facets in the fly's eye are different from each other so that the intensity of each pixel on the pupil can meet the requirements of SMO. Each of the field facets is constructed with a freeform surface to get the required arc-shaped illuminated area on the reticle. A method integrated with a numerical method and an optimization process is used to design the freeform surface of the field facets. The simulation result of the design for a prescribed freeform pixelated pupil shows that the uniformity on the reticle is 96.4%, and the pupil intensity error is approximated to be 0.035. The results indicate that the system is effective in generating the required freeform pixelated pupil and reducing the restrictions imposed on the SMO process in EUV lithography. [ABSTRACT FROM AUTHOR]
Copyright of Optical Engineering is the property of SPIE - International Society of Optical Engineering and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
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DbLabel: Engineering Source
An: 124470511
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  Data: Illumination system with freeform fly's eye to generate pixelated pupil prescribed by source-mask optimization in extreme ultraviolet lithography.
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  Data: <searchLink fieldCode="AR" term="%22Jiahua+Jiang%22">Jiahua Jiang</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Qiuli+Mei%22">Qiuli Mei</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Yanqiu+Li%22">Yanqiu Li</searchLink><relatesTo>1</relatesTo><i> liyanqiu@bit.edu.cn</i><br /><searchLink fieldCode="AR" term="%22Yan+Liu%22">Yan Liu</searchLink><relatesTo>1</relatesTo>
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  Data: <searchLink fieldCode="JN" term="%22Optical+Engineering%22">Optical Engineering</searchLink>. Jun2017, Vol. 56 Issue 6, p1-5. 5p.
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  Data: <searchLink fieldCode="DE" term="%22Ultraviolet+lithography%22">Ultraviolet lithography</searchLink><br /><searchLink fieldCode="DE" term="%22Lithography+techniques%22">Lithography techniques</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: Source-mask optimization (SMO) has emerged as a key technique for 7-nm node and beyond in extreme ultraviolet (EUV) lithography. The pupil required by SMO is usually pixelated, with a free choice of intensity per pixel. However, due to the discrete nature of the EUV illumination system, pupil intensity in current EUV SMO must also be discretized. An illumination system with a freeform fly's eye that is able to generate the pixelated pupil is proposed. Clear apertures of the field facets in the fly's eye are different from each other so that the intensity of each pixel on the pupil can meet the requirements of SMO. Each of the field facets is constructed with a freeform surface to get the required arc-shaped illuminated area on the reticle. A method integrated with a numerical method and an optimization process is used to design the freeform surface of the field facets. The simulation result of the design for a prescribed freeform pixelated pupil shows that the uniformity on the reticle is 96.4%, and the pupil intensity error is approximated to be 0.035. The results indicate that the system is effective in generating the required freeform pixelated pupil and reducing the restrictions imposed on the SMO process in EUV lithography. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Optical Engineering is the property of SPIE - International Society of Optical Engineering and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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RecordInfo BibRecord:
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    Identifiers:
      – Type: doi
        Value: 10.1117/1.OE.56.6.065101
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      – Code: eng
        Text: English
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      Pagination:
        PageCount: 5
        StartPage: 1
    Subjects:
      – SubjectFull: Ultraviolet lithography
        Type: general
      – SubjectFull: Lithography techniques
        Type: general
    Titles:
      – TitleFull: Illumination system with freeform fly's eye to generate pixelated pupil prescribed by source-mask optimization in extreme ultraviolet lithography.
        Type: main
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          Name:
            NameFull: Jiahua Jiang
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          Name:
            NameFull: Qiuli Mei
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            NameFull: Yanqiu Li
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            NameFull: Yan Liu
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            – D: 01
              M: 06
              Text: Jun2017
              Type: published
              Y: 2017
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              Value: 00913286
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            – Type: volume
              Value: 56
            – Type: issue
              Value: 6
          Titles:
            – TitleFull: Optical Engineering
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