Development and reliability study of 3D WLCSP for CMOS image sensor using vertical TSVs with 3:1 aspect ratio.
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| Title: | Development and reliability study of 3D WLCSP for CMOS image sensor using vertical TSVs with 3:1 aspect ratio. |
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| Authors: | Xiao, Zhiyi, Yao, Mingjun1, Yu, Daquan1 Daquan.yu@htkjks.com, Zhou, Minghao2, Dai, Fengwei2, Fan, Jun1, Xiang, Min1, Zhang, Wei3 |
| Source: | Microsystem Technologies. Oct2017, Vol. 23 Issue 10, p4879-4889. 11p. |
| Subjects: | Chip scale packaging, Electroplating, Reliability in engineering, Wafer level packaging, CMOS integrated circuits, Image sensors, Aspect ratio (Images) |
| Abstract: | 3D wafer-level chip scale packaging (3D WLCSP) using via last through silicon via (TSV) technology is an ideal technology to meet small-form-factor, high I/O density, high-speed, short time to market and lower cost product requirements. In this study, process development and reliability evaluation of 3D WLCSP for CMOS Image Sensor (CIS) using vertical TSVs with 3:1 aspect ratio were presented. Key processes including wafer bonding, wafer backside grinding, silicon etch, bottom oxide etch, via cleaning, barrier/seed layer deposition, electroplating, redistribution layer (RDL) and ball grid array (BGA) formation were developed. Reliability of the developed WLCSP was characterized by various tests. The failed devices after reliability tests were analyzed using microstructure observation and finite element simulation for stress distribution of TSV structure. The results indicate that WLCSP with vertical via last scheme can provide a reliable, low-cost solution for the next-generation CIS requiring high density routing. [ABSTRACT FROM AUTHOR] |
| Copyright of Microsystem Technologies is the property of Springer Nature and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.) | |
| Database: | Engineering Source |
| FullText | Text: Availability: 0 |
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| Header | DbId: egs DbLabel: Engineering Source An: 125148085 AccessLevel: 6 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: Development and reliability study of 3D WLCSP for CMOS image sensor using vertical TSVs with 3:1 aspect ratio. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AR" term="%22Xiao%2C+Zhiyi%22">Xiao, Zhiyi</searchLink><br /><searchLink fieldCode="AR" term="%22Yao%2C+Mingjun%22">Yao, Mingjun</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Yu%2C+Daquan%22">Yu, Daquan</searchLink><relatesTo>1</relatesTo><i> Daquan.yu@htkjks.com</i><br /><searchLink fieldCode="AR" term="%22Zhou%2C+Minghao%22">Zhou, Minghao</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AR" term="%22Dai%2C+Fengwei%22">Dai, Fengwei</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AR" term="%22Fan%2C+Jun%22">Fan, Jun</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Xiang%2C+Min%22">Xiang, Min</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Zhang%2C+Wei%22">Zhang, Wei</searchLink><relatesTo>3</relatesTo> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Microsystem+Technologies%22">Microsystem Technologies</searchLink>. Oct2017, Vol. 23 Issue 10, p4879-4889. 11p. – Name: Subject Label: Subjects Group: Su Data: <searchLink fieldCode="DE" term="%22Chip+scale+packaging%22">Chip scale packaging</searchLink><br /><searchLink fieldCode="DE" term="%22Electroplating%22">Electroplating</searchLink><br /><searchLink fieldCode="DE" term="%22Reliability+in+engineering%22">Reliability in engineering</searchLink><br /><searchLink fieldCode="DE" term="%22Wafer+level+packaging%22">Wafer level packaging</searchLink><br /><searchLink fieldCode="DE" term="%22CMOS+integrated+circuits%22">CMOS integrated circuits</searchLink><br /><searchLink fieldCode="DE" term="%22Image+sensors%22">Image sensors</searchLink><br /><searchLink fieldCode="DE" term="%22Aspect+ratio+%28Images%29%22">Aspect ratio (Images)</searchLink> – Name: Abstract Label: Abstract Group: Ab Data: 3D wafer-level chip scale packaging (3D WLCSP) using via last through silicon via (TSV) technology is an ideal technology to meet small-form-factor, high I/O density, high-speed, short time to market and lower cost product requirements. In this study, process development and reliability evaluation of 3D WLCSP for CMOS Image Sensor (CIS) using vertical TSVs with 3:1 aspect ratio were presented. Key processes including wafer bonding, wafer backside grinding, silicon etch, bottom oxide etch, via cleaning, barrier/seed layer deposition, electroplating, redistribution layer (RDL) and ball grid array (BGA) formation were developed. Reliability of the developed WLCSP was characterized by various tests. The failed devices after reliability tests were analyzed using microstructure observation and finite element simulation for stress distribution of TSV structure. The results indicate that WLCSP with vertical via last scheme can provide a reliable, low-cost solution for the next-generation CIS requiring high density routing. [ABSTRACT FROM AUTHOR] – Name: AbstractSuppliedCopyright Label: Group: Ab Data: <i>Copyright of Microsystem Technologies is the property of Springer Nature and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.) |
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| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1007/s00542-016-3267-7 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 11 StartPage: 4879 Subjects: – SubjectFull: Chip scale packaging Type: general – SubjectFull: Electroplating Type: general – SubjectFull: Reliability in engineering Type: general – SubjectFull: Wafer level packaging Type: general – SubjectFull: CMOS integrated circuits Type: general – SubjectFull: Image sensors Type: general – SubjectFull: Aspect ratio (Images) Type: general Titles: – TitleFull: Development and reliability study of 3D WLCSP for CMOS image sensor using vertical TSVs with 3:1 aspect ratio. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Xiao, Zhiyi – PersonEntity: Name: NameFull: Yao, Mingjun – PersonEntity: Name: NameFull: Yu, Daquan – PersonEntity: Name: NameFull: Zhou, Minghao – PersonEntity: Name: NameFull: Dai, Fengwei – PersonEntity: Name: NameFull: Fan, Jun – PersonEntity: Name: NameFull: Xiang, Min – PersonEntity: Name: NameFull: Zhang, Wei IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 10 Text: Oct2017 Type: published Y: 2017 Identifiers: – Type: issn-print Value: 09467076 Numbering: – Type: volume Value: 23 – Type: issue Value: 10 Titles: – TitleFull: Microsystem Technologies Type: main |
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