Magnetoresistance Relaxation Anisotropy of Nanostructured La-Sr(Ca)-Mn-O Films Induced by High-Pulsed Magnetic Fields.

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Title: Magnetoresistance Relaxation Anisotropy of Nanostructured La-Sr(Ca)-Mn-O Films Induced by High-Pulsed Magnetic Fields.
Authors: Zurauskiene, Nerija1, Pavilonis, Dainius1, Klimantavicius, Jonas1, Balevicius, Saulius1, Stankevic, Voitech1, Vasiliauskas, Remigijus1, Plausinaitiene, Valentina1, Abrutis, Adulfas2, Skapas, Martynas1, Juskenas, Remigijus1
Source: IEEE Transactions on Plasma Science. Oct2017 Part 1, Vol. 45 Issue 10, Part 1, p2773-2779. 7p.
Subjects: Magnetic properties of lanthanum strontium manganese oxide, Magnetoresistance, Magnetic properties of nanostructured materials, Anisotropy, Magnetic fields, Chemical relaxation, Metal organic chemical vapor deposition
Abstract: The results of investigation of colossal magnetoresistance relaxation in nanostructured La-Sr(Ca)-Mn-O films upon removal of magnetic field pulse are presented. Thin films having thicknesses of 75–350 nm grown by pulsed injection metal–organic chemical vapor deposition technique were studied in pulsed magnetic fields having duration of 0.9 ms and amplitudes of 2–12 T. It was obtained that “fast” relaxation process occurring in hundred microseconds time scale exhibits anisotropy: the magnitude of remnant resistivity is approximately three times smaller and the process is faster when magnetic field is applied perpendicular to the film plane in comparison with in-plane direction. The dynamics of this relaxation process was analyzed using Kolmogorov–Avrami–Fatuzzo model, taking into account nucleation and reorientation of magnetic domains into equilibrium state. The “fast” remnant relaxation was not observed after the application of longer pulses (20 ms) having amplitude of 60 T. Influence of remnant relaxation on operation of B-scalar magnetic field sensors based on nanostructured manganite films is discussed. [ABSTRACT FROM PUBLISHER]
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  Data: The results of investigation of colossal magnetoresistance relaxation in nanostructured La-Sr(Ca)-Mn-O films upon removal of magnetic field pulse are presented. Thin films having thicknesses of 75–350 nm grown by pulsed injection metal–organic chemical vapor deposition technique were studied in pulsed magnetic fields having duration of 0.9 ms and amplitudes of 2–12 T. It was obtained that “fast” relaxation process occurring in hundred microseconds time scale exhibits anisotropy: the magnitude of remnant resistivity is approximately three times smaller and the process is faster when magnetic field is applied perpendicular to the film plane in comparison with in-plane direction. The dynamics of this relaxation process was analyzed using Kolmogorov–Avrami–Fatuzzo model, taking into account nucleation and reorientation of magnetic domains into equilibrium state. The “fast” remnant relaxation was not observed after the application of longer pulses (20 ms) having amplitude of 60 T. Influence of remnant relaxation on operation of B-scalar magnetic field sensors based on nanostructured manganite films is discussed. [ABSTRACT FROM PUBLISHER]
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  Data: <i>Copyright of IEEE Transactions on Plasma Science is the property of IEEE and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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        Value: 10.1109/TPS.2017.2688727
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        Text: English
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      – SubjectFull: Magnetic properties of lanthanum strontium manganese oxide
        Type: general
      – SubjectFull: Magnetoresistance
        Type: general
      – SubjectFull: Magnetic properties of nanostructured materials
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      – SubjectFull: Anisotropy
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      – SubjectFull: Magnetic fields
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      – SubjectFull: Chemical relaxation
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      – SubjectFull: Metal organic chemical vapor deposition
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              Text: Oct2017 Part 1
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