Bibliographic Details
| Title: |
Large area ultraviolet photodetector on surface modified Si:GaN layers. |
| Authors: |
R., Anitha1 manithaakshi@gmail.com, R., Ramesh2, R., Loganathan3, Vavilapalli, Durga Sankar1, Baskar, K.1,4, Singh, Shubra1 shubra6@gmail.com |
| Source: |
Applied Surface Science. Mar2018, Vol. 435, p1057-1064. 8p. |
| Subjects: |
Ultraviolet radiation, Photodetectors, Heterojunctions, Gallium nitride, Zinc oxide thin films |
| Abstract: |
Unique features of semiconductor based heterostructured photoelectric devices have drawn considerable attention in the recent past. In the present work, large area UV photodetector has been fabricated utilizing interesting Zinc oxide microstructures on etched Si:GaN layers. The surface of Si:GaN layer grown by metal organic chemical vapor deposition method on sapphire has been modified by chemical etching to control the microstructure. The photodetector exhibits response to Ultraviolet light only. Optimum etching of Si:GaN was required to exhibit higher responsivity (0.96 A/W) and detectivity (∼4.87 × 10 9 Jones), the two important parameters for a photodetector. Present method offers a tunable functionality of photodetector through modification of top layer microstructure. A comparison with state of art materials has also been presented. [ABSTRACT FROM AUTHOR] |
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| Database: |
Engineering Source |
