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Co-electrodeposition of U and Mo from a LiCl-KCl melt.

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Title: Co-electrodeposition of U and Mo from a LiCl-KCl melt.
Authors: Lee, Na-Ri1,2, Kang, Byungman1, Choi, Suhee1, Bae, Sang-Eun1,3 sebae@kaeri.re.kr, Park, Tae-Hong1,3, Kim, Jong-Yun1,3, Kim, Jongwon2 jongwonkim@chungbuk.ac.kr
Source: Journal of Nuclear Materials. Feb2018, Vol. 499, p98-106. 9p.
Subjects: Electroplating, Cyclic voltammetry, Molybdenum compounds, Uranium, Energy dispersive X-ray spectroscopy
Abstract: Co-electrodeposition of uranium and molybdenum from a LiCl-KCl melt was investigated using cyclic voltammetry (CV), scanning electron microscopy (SEM), energy dispersive spectroscopy (EDS), and X-ray diffraction (XRD). The electrochemical study showed that the electrodeposition of Mo occurred from a molten LiCl-KCl eutectic at potentials more negative than −0.3 V vs. Ag|Ag + . Electrodeposition at a low overpotential range (between −0.3 V and −0.35 V) resulted in flat, thin Mo films, whereas greater overpotentials led to the growth of 3D films. Conditions for simultaneous electrodeposition of U and Mo were then optimized by varying the concentrations of UCl 3 and MoCl 3 and the electrodeposition method applied. At a constant potential of −1.58 V, a melt containing 1.3 wt% UCl 3 and 1.5 wt% MoCl 3 resulted in the co-electrodeposition of dendrites due to the high overpotential for Mo electrodeposition. However, diffusion-controlled electrodeposition using the same potential and concentration resulted in a uniform and flat U-Mo film. This co-electrodeposition of U-Mo films could be applied to the preparation of low-cost U-Mo nuclear fuel. [ABSTRACT FROM AUTHOR]
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Database: Engineering Source
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Abstract:Co-electrodeposition of uranium and molybdenum from a LiCl-KCl melt was investigated using cyclic voltammetry (CV), scanning electron microscopy (SEM), energy dispersive spectroscopy (EDS), and X-ray diffraction (XRD). The electrochemical study showed that the electrodeposition of Mo occurred from a molten LiCl-KCl eutectic at potentials more negative than −0.3 V vs. Ag|Ag + . Electrodeposition at a low overpotential range (between −0.3 V and −0.35 V) resulted in flat, thin Mo films, whereas greater overpotentials led to the growth of 3D films. Conditions for simultaneous electrodeposition of U and Mo were then optimized by varying the concentrations of UCl 3 and MoCl 3 and the electrodeposition method applied. At a constant potential of −1.58 V, a melt containing 1.3 wt% UCl 3 and 1.5 wt% MoCl 3 resulted in the co-electrodeposition of dendrites due to the high overpotential for Mo electrodeposition. However, diffusion-controlled electrodeposition using the same potential and concentration resulted in a uniform and flat U-Mo film. This co-electrodeposition of U-Mo films could be applied to the preparation of low-cost U-Mo nuclear fuel. [ABSTRACT FROM AUTHOR]
ISSN:00223115
DOI:10.1016/j.jnucmat.2017.11.009