View in EDS HTML Full Text PDF Full Text

Development of an EUV Microscope with Focused Coherent EUV Based on Coherent Diffraction Imaging Method for Defect Evaluation on an EUV Mask.

Saved in:
Bibliographic Details
Title: Development of an EUV Microscope with Focused Coherent EUV Based on Coherent Diffraction Imaging Method for Defect Evaluation on an EUV Mask.
Authors: HARADA, T. E. T. S. U. O.1, HASHIMOTO, H. I. R. A. K. U.1, WATANABE, T. A. K. E. O.1
Source: Electronics & Communications in Japan. Mar2018, Vol. 101 Issue 3, p11-16. 6p.
Subjects: Extreme ultraviolet lithography, Fresnel function, Diffractive scattering, Phase-contrast microscopy, Lithography
Abstract: SUMMARY: For evaluation of defects on extreme ultraviolet (EUV) masks at the blank state of manufacturing, we developed a microcoherent EUV scatterometry microscope (micro‐CSM). The illumination source is coherent EUV light with a 140‐nm focus diameter on the defect using a Fresnel zoneplate. This system directly observes the reflection and diffraction signals from a phase defect. The phase and the intensity image of the defect is reconstructed with the diffraction images using ptychography, which is an algorithm of the coherent diffraction imaging. We observed programmed phase defect on a blank EUV mask. Phase distributions of these programmed defects were well reconstructed quantitatively. We also observed actual defects which were inspected by the ABI tool. Actual amplitude defect and phase defect images were reconstructed with intensity and phase contrast. The reconstructed image indicated the defect type of these defect. The micro‐CSM is very powerful tool to evaluate an EUV phase defect. [ABSTRACT FROM AUTHOR]
Copyright of Electronics & Communications in Japan is the property of Wiley-Blackwell and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database: Engineering Source
Full text is not displayed to guests.
FullText Links:
  – Type: pdflink
Text:
  Availability: 1
Header DbId: egs
DbLabel: Engineering Source
An: 127875855
AccessLevel: 6
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
IllustrationInfo
Items – Name: Title
  Label: Title
  Group: Ti
  Data: Development of an EUV Microscope with Focused Coherent EUV Based on Coherent Diffraction Imaging Method for Defect Evaluation on an EUV Mask.
– Name: Author
  Label: Authors
  Group: Au
  Data: <searchLink fieldCode="AR" term="%22HARADA%2C+T%2E+E%2E+T%2E+S%2E+U%2E+O%2E%22">HARADA, T. E. T. S. U. O.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22HASHIMOTO%2C+H%2E+I%2E+R%2E+A%2E+K%2E+U%2E%22">HASHIMOTO, H. I. R. A. K. U.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22WATANABE%2C+T%2E+A%2E+K%2E+E%2E+O%2E%22">WATANABE, T. A. K. E. O.</searchLink><relatesTo>1</relatesTo>
– Name: TitleSource
  Label: Source
  Group: Src
  Data: <searchLink fieldCode="JN" term="%22Electronics+%26+Communications+in+Japan%22">Electronics & Communications in Japan</searchLink>. Mar2018, Vol. 101 Issue 3, p11-16. 6p.
– Name: Subject
  Label: Subjects
  Group: Su
  Data: <searchLink fieldCode="DE" term="%22Extreme+ultraviolet+lithography%22">Extreme ultraviolet lithography</searchLink><br /><searchLink fieldCode="DE" term="%22Fresnel+function%22">Fresnel function</searchLink><br /><searchLink fieldCode="DE" term="%22Diffractive+scattering%22">Diffractive scattering</searchLink><br /><searchLink fieldCode="DE" term="%22Phase-contrast+microscopy%22">Phase-contrast microscopy</searchLink><br /><searchLink fieldCode="DE" term="%22Lithography%22">Lithography</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: SUMMARY: For evaluation of defects on extreme ultraviolet (EUV) masks at the blank state of manufacturing, we developed a microcoherent EUV scatterometry microscope (micro‐CSM). The illumination source is coherent EUV light with a 140‐nm focus diameter on the defect using a Fresnel zoneplate. This system directly observes the reflection and diffraction signals from a phase defect. The phase and the intensity image of the defect is reconstructed with the diffraction images using ptychography, which is an algorithm of the coherent diffraction imaging. We observed programmed phase defect on a blank EUV mask. Phase distributions of these programmed defects were well reconstructed quantitatively. We also observed actual defects which were inspected by the ABI tool. Actual amplitude defect and phase defect images were reconstructed with intensity and phase contrast. The reconstructed image indicated the defect type of these defect. The micro‐CSM is very powerful tool to evaluate an EUV phase defect. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Electronics & Communications in Japan is the property of Wiley-Blackwell and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=egs&AN=127875855
RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1002/ecj.12028
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 6
        StartPage: 11
    Subjects:
      – SubjectFull: Extreme ultraviolet lithography
        Type: general
      – SubjectFull: Fresnel function
        Type: general
      – SubjectFull: Diffractive scattering
        Type: general
      – SubjectFull: Phase-contrast microscopy
        Type: general
      – SubjectFull: Lithography
        Type: general
    Titles:
      – TitleFull: Development of an EUV Microscope with Focused Coherent EUV Based on Coherent Diffraction Imaging Method for Defect Evaluation on an EUV Mask.
        Type: main
  BibRelationships:
    HasContributorRelationships:
      – PersonEntity:
          Name:
            NameFull: HARADA, T. E. T. S. U. O.
      – PersonEntity:
          Name:
            NameFull: HASHIMOTO, H. I. R. A. K. U.
      – PersonEntity:
          Name:
            NameFull: WATANABE, T. A. K. E. O.
    IsPartOfRelationships:
      – BibEntity:
          Dates:
            – D: 01
              M: 03
              Text: Mar2018
              Type: published
              Y: 2018
          Identifiers:
            – Type: issn-print
              Value: 19429533
          Numbering:
            – Type: volume
              Value: 101
            – Type: issue
              Value: 3
          Titles:
            – TitleFull: Electronics & Communications in Japan
              Type: main
ResultId 1