APA (7th ed.) Citation

Lee, J., Lee, H., & Yang, J. (2018). A rasterization method for generating exposure pattern images with optical maskless lithography. Journal of Mechanical Science & Technology, 32(5), 2209. https://doi.org/10.1007/s12206-018-0431-2

Chicago Style (17th ed.) Citation

Lee, Jinwon, Hyungku Lee, and Jeongsam Yang. "A Rasterization Method for Generating Exposure Pattern Images with Optical Maskless Lithography." Journal of Mechanical Science & Technology 32, no. 5 (2018): 2209. https://doi.org/10.1007/s12206-018-0431-2.

MLA (9th ed.) Citation

Lee, Jinwon, et al. "A Rasterization Method for Generating Exposure Pattern Images with Optical Maskless Lithography." Journal of Mechanical Science & Technology, vol. 32, no. 5, 2018, p. 2209, https://doi.org/10.1007/s12206-018-0431-2.