A rasterization method for generating exposure pattern images with optical maskless lithography.
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| Title: | A rasterization method for generating exposure pattern images with optical maskless lithography. |
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| Authors: | Lee, Jinwon1, Lee, Hyungku2, Yang, Jeongsam1 jyang@ajou.ac.kr |
| Source: | Journal of Mechanical Science & Technology. May2018, Vol. 32 Issue 5, p2209-2218. 10p. |
| Subjects: | Lithography techniques, Electronics, Photoresist materials, Printed circuit design, Pixel density measurement |
| Abstract: | One of the core technologies used for high-density integration of electronic parts is a lithography method that draws a microcircuit by irradiating light onto photoresist. Because maskless lithography technology that employs a digital micromirror device (DMD) uses continuous exposure patterns, a huge amount of image frame data is required, and, moreover, a long calculation time is required to create exposure pattern images. In this paper, we propose a rasterization method that exposes continuous image frames onto a single overlay lithography image using GPU-accelerated path rendering and CPU parallel computing, creating a high-quality exposure pattern image at a high speed. This method enables effective rasterization using multiple CPU and GPU cores to create lithography image data. Additionally, it is possible to reduce the size of the data file by exposing a printed circuit board (PCB) in a single overlay image frame, rather than the conventional consecutive frames. [ABSTRACT FROM AUTHOR] |
| Copyright of Journal of Mechanical Science & Technology is the property of Springer Nature and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.) | |
| Database: | Engineering Source |
| FullText | Links: – Type: pdflink Text: Availability: 0 |
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| Header | DbId: egs DbLabel: Engineering Source An: 129628776 AccessLevel: 6 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: A rasterization method for generating exposure pattern images with optical maskless lithography. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AR" term="%22Lee%2C+Jinwon%22">Lee, Jinwon</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Lee%2C+Hyungku%22">Lee, Hyungku</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AR" term="%22Yang%2C+Jeongsam%22">Yang, Jeongsam</searchLink><relatesTo>1</relatesTo><i> jyang@ajou.ac.kr</i> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Journal+of+Mechanical+Science+%26+Technology%22">Journal of Mechanical Science & Technology</searchLink>. May2018, Vol. 32 Issue 5, p2209-2218. 10p. – Name: Subject Label: Subjects Group: Su Data: <searchLink fieldCode="DE" term="%22Lithography+techniques%22">Lithography techniques</searchLink><br /><searchLink fieldCode="DE" term="%22Electronics%22">Electronics</searchLink><br /><searchLink fieldCode="DE" term="%22Photoresist+materials%22">Photoresist materials</searchLink><br /><searchLink fieldCode="DE" term="%22Printed+circuit+design%22">Printed circuit design</searchLink><br /><searchLink fieldCode="DE" term="%22Pixel+density+measurement%22">Pixel density measurement</searchLink> – Name: Abstract Label: Abstract Group: Ab Data: One of the core technologies used for high-density integration of electronic parts is a lithography method that draws a microcircuit by irradiating light onto photoresist. Because maskless lithography technology that employs a digital micromirror device (DMD) uses continuous exposure patterns, a huge amount of image frame data is required, and, moreover, a long calculation time is required to create exposure pattern images. In this paper, we propose a rasterization method that exposes continuous image frames onto a single overlay lithography image using GPU-accelerated path rendering and CPU parallel computing, creating a high-quality exposure pattern image at a high speed. This method enables effective rasterization using multiple CPU and GPU cores to create lithography image data. Additionally, it is possible to reduce the size of the data file by exposing a printed circuit board (PCB) in a single overlay image frame, rather than the conventional consecutive frames. [ABSTRACT FROM AUTHOR] – Name: AbstractSuppliedCopyright Label: Group: Ab Data: <i>Copyright of Journal of Mechanical Science & Technology is the property of Springer Nature and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.) |
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| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1007/s12206-018-0431-2 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 10 StartPage: 2209 Subjects: – SubjectFull: Lithography techniques Type: general – SubjectFull: Electronics Type: general – SubjectFull: Photoresist materials Type: general – SubjectFull: Printed circuit design Type: general – SubjectFull: Pixel density measurement Type: general Titles: – TitleFull: A rasterization method for generating exposure pattern images with optical maskless lithography. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Lee, Jinwon – PersonEntity: Name: NameFull: Lee, Hyungku – PersonEntity: Name: NameFull: Yang, Jeongsam IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 05 Text: May2018 Type: published Y: 2018 Identifiers: – Type: issn-print Value: 1738494X Numbering: – Type: volume Value: 32 – Type: issue Value: 5 Titles: – TitleFull: Journal of Mechanical Science & Technology Type: main |
| ResultId | 1 |
