Effect of substrate roughness on the magnetic properties of CoFeB films.

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Bibliographic Details
Title: Effect of substrate roughness on the magnetic properties of CoFeB films.
Authors: Xie, Hongkang1, Pan, Lining1, Cheng, Xiaohong1, Zhu, Zengtai1, Feng, Hongmei1, Liu, Qingfang1, Wang, Jianbo1,2
Source: Journal of Magnetism & Magnetic Materials. Sep2018, Vol. 461, p19-22. 4p.
Subjects: Cobalt compounds, Magnetic properties, Substrates (Materials science), Surface roughness, Silicon surfaces, Magnetron sputtering, Damping (Mechanics)
Abstract: In this paper, a serious of CoFeB films of 30 nm prepared by a DC magnetron sputtering on Si substrates with different roughness etched by NaOH solution are investigated. It is found that the coercivity ( H c ) and effective damping coefficient α are influenced by the substrate roughness of the films. As the substrate roughness increased to 73.9 nm, the H c ranged from 14.4 Oe to 81.4 Oe; the α, from 0.012 to 0.11 at the same time. It is attributed to the function of magnetic moment pinning and magnon-magnon scattering caused by the rough substrate. Thus, the tunable performances of soft magnetism and high frequency of CoFeB films make them become potential candidates for microwave-based devices and other tunable microwave devices. [ABSTRACT FROM AUTHOR]
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Database: Engineering Source
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Abstract:In this paper, a serious of CoFeB films of 30 nm prepared by a DC magnetron sputtering on Si substrates with different roughness etched by NaOH solution are investigated. It is found that the coercivity ( H c ) and effective damping coefficient α are influenced by the substrate roughness of the films. As the substrate roughness increased to 73.9 nm, the H c ranged from 14.4 Oe to 81.4 Oe; the α, from 0.012 to 0.11 at the same time. It is attributed to the function of magnetic moment pinning and magnon-magnon scattering caused by the rough substrate. Thus, the tunable performances of soft magnetism and high frequency of CoFeB films make them become potential candidates for microwave-based devices and other tunable microwave devices. [ABSTRACT FROM AUTHOR]
ISSN:03048853
DOI:10.1016/j.jmmm.2018.04.046