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Effect of substrate roughness on the magnetic properties of CoFeB films.

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Title: Effect of substrate roughness on the magnetic properties of CoFeB films.
Authors: Xie, Hongkang1, Pan, Lining1, Cheng, Xiaohong1, Zhu, Zengtai1, Feng, Hongmei1, Liu, Qingfang1, Wang, Jianbo1,2
Source: Journal of Magnetism & Magnetic Materials. Sep2018, Vol. 461, p19-22. 4p.
Subjects: Cobalt compounds, Magnetic properties, Substrates (Materials science), Surface roughness, Silicon surfaces, Magnetron sputtering, Damping (Mechanics)
Abstract: In this paper, a serious of CoFeB films of 30 nm prepared by a DC magnetron sputtering on Si substrates with different roughness etched by NaOH solution are investigated. It is found that the coercivity ( H c ) and effective damping coefficient α are influenced by the substrate roughness of the films. As the substrate roughness increased to 73.9 nm, the H c ranged from 14.4 Oe to 81.4 Oe; the α, from 0.012 to 0.11 at the same time. It is attributed to the function of magnetic moment pinning and magnon-magnon scattering caused by the rough substrate. Thus, the tunable performances of soft magnetism and high frequency of CoFeB films make them become potential candidates for microwave-based devices and other tunable microwave devices. [ABSTRACT FROM AUTHOR]
Copyright of Journal of Magnetism & Magnetic Materials is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database: Engineering Source
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Header DbId: egs
DbLabel: Engineering Source
An: 129734885
AccessLevel: 6
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Effect of substrate roughness on the magnetic properties of CoFeB films.
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  Data: <searchLink fieldCode="AR" term="%22Xie%2C+Hongkang%22">Xie, Hongkang</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Pan%2C+Lining%22">Pan, Lining</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Cheng%2C+Xiaohong%22">Cheng, Xiaohong</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Zhu%2C+Zengtai%22">Zhu, Zengtai</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Feng%2C+Hongmei%22">Feng, Hongmei</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Liu%2C+Qingfang%22">Liu, Qingfang</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Wang%2C+Jianbo%22">Wang, Jianbo</searchLink><relatesTo>1,2</relatesTo>
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Magnetism+%26+Magnetic+Materials%22">Journal of Magnetism & Magnetic Materials</searchLink>. Sep2018, Vol. 461, p19-22. 4p.
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  Data: <searchLink fieldCode="DE" term="%22Cobalt+compounds%22">Cobalt compounds</searchLink><br /><searchLink fieldCode="DE" term="%22Magnetic+properties%22">Magnetic properties</searchLink><br /><searchLink fieldCode="DE" term="%22Substrates+%28Materials+science%29%22">Substrates (Materials science)</searchLink><br /><searchLink fieldCode="DE" term="%22Surface+roughness%22">Surface roughness</searchLink><br /><searchLink fieldCode="DE" term="%22Silicon+surfaces%22">Silicon surfaces</searchLink><br /><searchLink fieldCode="DE" term="%22Magnetron+sputtering%22">Magnetron sputtering</searchLink><br /><searchLink fieldCode="DE" term="%22Damping+%28Mechanics%29%22">Damping (Mechanics)</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: In this paper, a serious of CoFeB films of 30 nm prepared by a DC magnetron sputtering on Si substrates with different roughness etched by NaOH solution are investigated. It is found that the coercivity ( H c ) and effective damping coefficient α are influenced by the substrate roughness of the films. As the substrate roughness increased to 73.9 nm, the H c ranged from 14.4 Oe to 81.4 Oe; the α, from 0.012 to 0.11 at the same time. It is attributed to the function of magnetic moment pinning and magnon-magnon scattering caused by the rough substrate. Thus, the tunable performances of soft magnetism and high frequency of CoFeB films make them become potential candidates for microwave-based devices and other tunable microwave devices. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Journal of Magnetism & Magnetic Materials is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1016/j.jmmm.2018.04.046
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 4
        StartPage: 19
    Subjects:
      – SubjectFull: Cobalt compounds
        Type: general
      – SubjectFull: Magnetic properties
        Type: general
      – SubjectFull: Substrates (Materials science)
        Type: general
      – SubjectFull: Surface roughness
        Type: general
      – SubjectFull: Silicon surfaces
        Type: general
      – SubjectFull: Magnetron sputtering
        Type: general
      – SubjectFull: Damping (Mechanics)
        Type: general
    Titles:
      – TitleFull: Effect of substrate roughness on the magnetic properties of CoFeB films.
        Type: main
  BibRelationships:
    HasContributorRelationships:
      – PersonEntity:
          Name:
            NameFull: Xie, Hongkang
      – PersonEntity:
          Name:
            NameFull: Pan, Lining
      – PersonEntity:
          Name:
            NameFull: Cheng, Xiaohong
      – PersonEntity:
          Name:
            NameFull: Zhu, Zengtai
      – PersonEntity:
          Name:
            NameFull: Feng, Hongmei
      – PersonEntity:
          Name:
            NameFull: Liu, Qingfang
      – PersonEntity:
          Name:
            NameFull: Wang, Jianbo
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          Dates:
            – D: 01
              M: 09
              Text: Sep2018
              Type: published
              Y: 2018
          Identifiers:
            – Type: issn-print
              Value: 03048853
          Numbering:
            – Type: volume
              Value: 461
          Titles:
            – TitleFull: Journal of Magnetism & Magnetic Materials
              Type: main
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