APA (7th ed.) Citation

Kamble, S. S., Radhakrishnan, J. K., & Krishnamoorthy, R. (2018). Effect of O2 flow rate on the characteristics of ZnO thin films deposited by RF reactive magnetron sputtering. Materials Technology, 33(11), 709. https://doi.org/10.1080/10667857.2018.1497834

Chicago Style (17th ed.) Citation

Kamble, Sudhir S., J. K. Radhakrishnan, and Rajavel Krishnamoorthy. "Effect of O2 Flow Rate on the Characteristics of ZnO Thin Films Deposited by RF Reactive Magnetron Sputtering." Materials Technology 33, no. 11 (2018): 709. https://doi.org/10.1080/10667857.2018.1497834.

MLA (9th ed.) Citation

Kamble, Sudhir S., et al. "Effect of O2 Flow Rate on the Characteristics of ZnO Thin Films Deposited by RF Reactive Magnetron Sputtering." Materials Technology, vol. 33, no. 11, 2018, p. 709, https://doi.org/10.1080/10667857.2018.1497834.