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Effect of O2 flow rate on the characteristics of ZnO thin films deposited by RF reactive magnetron sputtering.

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Title: Effect of O2 flow rate on the characteristics of ZnO thin films deposited by RF reactive magnetron sputtering.
Authors: Kamble, Sudhir S.1 sudhirsk@debel.drdo.in, Radhakrishnan, J. K.1, Krishnamoorthy, Rajavel2
Source: Materials Technology. Sep2018, Vol. 33 Issue 11, p709-715. 7p.
Subjects: Semiconductor thin films, Magnetron sputtering, X-ray diffraction, Microstructure, Lattice constants, Field emission electron microscopy, Scanning electron microscopy, Photoluminescence
Abstract: ZnO thin films were deposited on glass substrates by radio-frequency (RF) reactive sputtering under different O2 flow rates, with constant Ar flow rate (50sccm). The dependence of O2 flow rate on structural and optical properties of deposited ZnO films were studied comprehensively. From X-ray diffraction (XRD) data, the microstructural parameters such as lattice constant, average crystallite size and stress were estimated and correlated with the morphology and optical properties of the deposited ZnO films. Field emission scanning electron microscopy (FESEM) results reveal that, the deposited ZnO thin films have spherical shaped crystallites and their size decreases with increasing O2 flow rate. The optical properties were studied by UV-Vis transmission and photoluminescence (PL) spectroscopy. The room temperature PL study shows a near band edge emission (NBE), which exhibits a blue shift from 393 nm to 378 nm with increase in O2 flow rate, and defect related emission peaks in the visible region. [ABSTRACT FROM AUTHOR]
Copyright of Materials Technology is the property of Taylor & Francis Ltd and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
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  Data: Effect of O<subscript>2</subscript> flow rate on the characteristics of ZnO thin films deposited by RF reactive magnetron sputtering.
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  Data: <searchLink fieldCode="JN" term="%22Materials+Technology%22">Materials Technology</searchLink>. Sep2018, Vol. 33 Issue 11, p709-715. 7p.
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  Data: <searchLink fieldCode="DE" term="%22Semiconductor+thin+films%22">Semiconductor thin films</searchLink><br /><searchLink fieldCode="DE" term="%22Magnetron+sputtering%22">Magnetron sputtering</searchLink><br /><searchLink fieldCode="DE" term="%22X-ray+diffraction%22">X-ray diffraction</searchLink><br /><searchLink fieldCode="DE" term="%22Microstructure%22">Microstructure</searchLink><br /><searchLink fieldCode="DE" term="%22Lattice+constants%22">Lattice constants</searchLink><br /><searchLink fieldCode="DE" term="%22Field+emission+electron+microscopy%22">Field emission electron microscopy</searchLink><br /><searchLink fieldCode="DE" term="%22Scanning+electron+microscopy%22">Scanning electron microscopy</searchLink><br /><searchLink fieldCode="DE" term="%22Photoluminescence%22">Photoluminescence</searchLink>
– Name: Abstract
  Label: Abstract
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  Data: ZnO thin films were deposited on glass substrates by radio-frequency (RF) reactive sputtering under different O2 flow rates, with constant Ar flow rate (50sccm). The dependence of O2 flow rate on structural and optical properties of deposited ZnO films were studied comprehensively. From X-ray diffraction (XRD) data, the microstructural parameters such as lattice constant, average crystallite size and stress were estimated and correlated with the morphology and optical properties of the deposited ZnO films. Field emission scanning electron microscopy (FESEM) results reveal that, the deposited ZnO thin films have spherical shaped crystallites and their size decreases with increasing O2 flow rate. The optical properties were studied by UV-Vis transmission and photoluminescence (PL) spectroscopy. The room temperature PL study shows a near band edge emission (NBE), which exhibits a blue shift from 393 nm to 378 nm with increase in O2 flow rate, and defect related emission peaks in the visible region. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Materials Technology is the property of Taylor & Francis Ltd and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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        Value: 10.1080/10667857.2018.1497834
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      – Code: eng
        Text: English
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      – SubjectFull: Semiconductor thin films
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      – SubjectFull: Magnetron sputtering
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      – SubjectFull: X-ray diffraction
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      – SubjectFull: Microstructure
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      – SubjectFull: Lattice constants
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      – SubjectFull: Field emission electron microscopy
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      – SubjectFull: Scanning electron microscopy
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      – TitleFull: Effect of O2 flow rate on the characteristics of ZnO thin films deposited by RF reactive magnetron sputtering.
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            NameFull: Radhakrishnan, J. K.
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            NameFull: Krishnamoorthy, Rajavel
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              Text: Sep2018
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