APA (7th ed.) Citation

Chemla, M., Durand-Vidal, S., Zanna, S., Petitdidier, S., & Levy, D. (2004). Silicon surface wet cleaning and chemical oxide growth by a novel treatment in aqueous chlorine solutions. Electrochimica Acta, 49(21), 3545. https://doi.org/10.1016/j.electacta.2004.03.023

Chicago Style (17th ed.) Citation

Chemla, M., S. Durand-Vidal, S. Zanna, S. Petitdidier, and D. Levy. "Silicon Surface Wet Cleaning and Chemical Oxide Growth by a Novel Treatment in Aqueous Chlorine Solutions." Electrochimica Acta 49, no. 21 (2004): 3545. https://doi.org/10.1016/j.electacta.2004.03.023.

MLA (9th ed.) Citation

Chemla, M., et al. "Silicon Surface Wet Cleaning and Chemical Oxide Growth by a Novel Treatment in Aqueous Chlorine Solutions." Electrochimica Acta, vol. 49, no. 21, 2004, p. 3545, https://doi.org/10.1016/j.electacta.2004.03.023.