Dev, D. S. D., Krishna, E., & Das, M. (2019). Development of a non-contact plasma processing technique to mitigate chemical network defects of fused silica with life enhancement of He-Ne laser device. Optics & Laser Technology, 113, 289. https://doi.org/10.1016/j.optlastec.2018.12.028
Chicago Style (17th ed.) CitationDev, D. Sam Dayala, Enni Krishna, and Manas Das. "Development of a Non-contact Plasma Processing Technique to Mitigate Chemical Network Defects of Fused Silica with Life Enhancement of He-Ne Laser Device." Optics & Laser Technology 113 (2019): 289. https://doi.org/10.1016/j.optlastec.2018.12.028.
MLA (9th ed.) CitationDev, D. Sam Dayala, et al. "Development of a Non-contact Plasma Processing Technique to Mitigate Chemical Network Defects of Fused Silica with Life Enhancement of He-Ne Laser Device." Optics & Laser Technology, vol. 113, 2019, p. 289, https://doi.org/10.1016/j.optlastec.2018.12.028.