Development of a non-contact plasma processing technique to mitigate chemical network defects of fused silica with life enhancement of He-Ne laser device.
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| Title: | Development of a non-contact plasma processing technique to mitigate chemical network defects of fused silica with life enhancement of He-Ne laser device. |
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| Authors: | Dev, D. Sam Dayala1, Krishna, Enni1, Das, Manas1 manasdas@iitg.ernet.in |
| Source: | Optics & Laser Technology. May2019, Vol. 113, p289-302. 14p. |
| Subjects: | Plasma materials processing, Crystal defects, Fused silica, Helium, Neon, Laser beams, Raman microscopy |
| Abstract: | Highlights • Non-contact plasma process is adopted to remove atomic level defects in fine finished TIR optics. • Novel qualitative method using in-situ laser illumination is introduced for analysis of sub-micron cracks in optics. • Raman microscopy is identified for understanding chemical structure integrity of fused silica. • PSD characteristics of fused silica shows 80% reduction in higher spatial wave length after plasma processing. • Plasma processed optics enhances the life of the optical device significantly. Abstract Surface characteristic as well as bulk properties of optics play a significant role in the performance and the life of the optical device. In this paper a non-contact type plasma processing methodology is adopted to remove sub-micron cracks hidden under surface as generated due to contact mechanical processing. A novel qualitative method is introduced for analysis of sub-micron cracks present at the surface/sub-surface of the optics by using in-situ laser illumination. Raman microscopy is identified for understanding the improvement in chemical structure integrity of the fused silica. Power spectrum density characteristics of fused silica shows 80% reduction in higher spatial wave length after plasma processing which signifies improvement in surface figure. Life of the optical device is enhanced drastically by non-contact plasma processing methodology. The present study proposes a method for futuristic manufacturing of optics for achieving perfect surface structure without affecting surface roughness. [ABSTRACT FROM AUTHOR] |
| Copyright of Optics & Laser Technology is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.) | |
| Database: | Engineering Source |
| FullText | Text: Availability: 0 |
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| Header | DbId: egs DbLabel: Engineering Source An: 134550282 AccessLevel: 6 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: Development of a non-contact plasma processing technique to mitigate chemical network defects of fused silica with life enhancement of He-Ne laser device. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AR" term="%22Dev%2C+D%2E+Sam+Dayala%22">Dev, D. Sam Dayala</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Krishna%2C+Enni%22">Krishna, Enni</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Das%2C+Manas%22">Das, Manas</searchLink><relatesTo>1</relatesTo><i> manasdas@iitg.ernet.in</i> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Optics+%26+Laser+Technology%22">Optics & Laser Technology</searchLink>. May2019, Vol. 113, p289-302. 14p. – Name: Subject Label: Subjects Group: Su Data: <searchLink fieldCode="DE" term="%22Plasma+materials+processing%22">Plasma materials processing</searchLink><br /><searchLink fieldCode="DE" term="%22Crystal+defects%22">Crystal defects</searchLink><br /><searchLink fieldCode="DE" term="%22Fused+silica%22">Fused silica</searchLink><br /><searchLink fieldCode="DE" term="%22Helium%22">Helium</searchLink><br /><searchLink fieldCode="DE" term="%22Neon%22">Neon</searchLink><br /><searchLink fieldCode="DE" term="%22Laser+beams%22">Laser beams</searchLink><br /><searchLink fieldCode="DE" term="%22Raman+microscopy%22">Raman microscopy</searchLink> – Name: Abstract Label: Abstract Group: Ab Data: Highlights • Non-contact plasma process is adopted to remove atomic level defects in fine finished TIR optics. • Novel qualitative method using in-situ laser illumination is introduced for analysis of sub-micron cracks in optics. • Raman microscopy is identified for understanding chemical structure integrity of fused silica. • PSD characteristics of fused silica shows 80% reduction in higher spatial wave length after plasma processing. • Plasma processed optics enhances the life of the optical device significantly. Abstract Surface characteristic as well as bulk properties of optics play a significant role in the performance and the life of the optical device. In this paper a non-contact type plasma processing methodology is adopted to remove sub-micron cracks hidden under surface as generated due to contact mechanical processing. A novel qualitative method is introduced for analysis of sub-micron cracks present at the surface/sub-surface of the optics by using in-situ laser illumination. Raman microscopy is identified for understanding the improvement in chemical structure integrity of the fused silica. Power spectrum density characteristics of fused silica shows 80% reduction in higher spatial wave length after plasma processing which signifies improvement in surface figure. Life of the optical device is enhanced drastically by non-contact plasma processing methodology. The present study proposes a method for futuristic manufacturing of optics for achieving perfect surface structure without affecting surface roughness. [ABSTRACT FROM AUTHOR] – Name: AbstractSuppliedCopyright Label: Group: Ab Data: <i>Copyright of Optics & Laser Technology is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.) |
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| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1016/j.optlastec.2018.12.028 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 14 StartPage: 289 Subjects: – SubjectFull: Plasma materials processing Type: general – SubjectFull: Crystal defects Type: general – SubjectFull: Fused silica Type: general – SubjectFull: Helium Type: general – SubjectFull: Neon Type: general – SubjectFull: Laser beams Type: general – SubjectFull: Raman microscopy Type: general Titles: – TitleFull: Development of a non-contact plasma processing technique to mitigate chemical network defects of fused silica with life enhancement of He-Ne laser device. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Dev, D. Sam Dayala – PersonEntity: Name: NameFull: Krishna, Enni – PersonEntity: Name: NameFull: Das, Manas IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 05 Text: May2019 Type: published Y: 2019 Identifiers: – Type: issn-print Value: 00303992 Numbering: – Type: volume Value: 113 Titles: – TitleFull: Optics & Laser Technology Type: main |
| ResultId | 1 |
