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AFM, RBS and tribological properties of WC/WS2 nanostructures after 1.5 MeV Nb+ implantation.

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Title: AFM, RBS and tribological properties of WC/WS2 nanostructures after 1.5 MeV Nb+ implantation.
Authors: Burducea, I.1 (AUTHOR) bion@nipne.ro, Mateescu, A.O.1 (AUTHOR), Mateescu, G.1 (AUTHOR), Ionescu, C.1 (AUTHOR), Straticiuc, M.1 (AUTHOR), Craciun, L.S.1 (AUTHOR), Lungu, C.P.1 (AUTHOR), Pompilian, G.O.1 (AUTHOR), Racolta, P.M.1 (AUTHOR)
Source: Nuclear Instruments & Methods in Physics Research Section B. Jul2019, Vol. 450, p357-360. 4p.
Subjects: Magnetron sputtering, Ion implantation, Rutherford backscattering spectrometry, Nuclear physics, Ion bombardment, Nuclear engineering
Abstract: The purpose of this study was to evaluate the impact of Nb+ ion implantation in WC/WS 2 nanostructures and their tribological properties. The films were deposited on silicon and stainless-steel substrates by DC and RF magnetron sputtering at 400 °C. Different concentrations for sputtering of the WC targets were used while the concentration for WS 2 was maintained constant for all the deposition processes. Nb ion implantation with an energy of 1.5 MeV and a dose of 6 × 1014 ions/cm2 at room temperature was done at the 3 MV Tandetron™ accelerator from "Horia Hulubei" National Institute for Physics and Nuclear Engineering – IFIN-HH. The topography of the samples was analyzed by atomic force microscopy (AFM). Rutherford backscattering spectrometry (RBS) investigations gave information regarding stoichiometry and thicknesses of the coatings while tribological properties were studied using a pin–on–ball tribometer before and after Nb ion implantation. We have found that after the Nb implantation the values measured for the coefficient of friction were lower as compared to the unimplanted samples thought to be due to the discrete amorphization sites which could be produced at this lower fluence by energy deposition through elastic and inelastic collisions. [ABSTRACT FROM AUTHOR]
Copyright of Nuclear Instruments & Methods in Physics Research Section B is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
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DbLabel: Engineering Source
An: 137111328
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  Data: AFM, RBS and tribological properties of WC/WS2 nanostructures after 1.5 MeV Nb+ implantation.
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  Data: <searchLink fieldCode="AR" term="%22Burducea%2C+I%2E%22">Burducea, I.</searchLink><relatesTo>1</relatesTo> (AUTHOR)<i> bion@nipne.ro</i><br /><searchLink fieldCode="AR" term="%22Mateescu%2C+A%2EO%2E%22">Mateescu, A.O.</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Mateescu%2C+G%2E%22">Mateescu, G.</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Ionescu%2C+C%2E%22">Ionescu, C.</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Straticiuc%2C+M%2E%22">Straticiuc, M.</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Craciun%2C+L%2ES%2E%22">Craciun, L.S.</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Lungu%2C+C%2EP%2E%22">Lungu, C.P.</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Pompilian%2C+G%2EO%2E%22">Pompilian, G.O.</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Racolta%2C+P%2EM%2E%22">Racolta, P.M.</searchLink><relatesTo>1</relatesTo> (AUTHOR)
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  Data: <searchLink fieldCode="DE" term="%22Magnetron+sputtering%22">Magnetron sputtering</searchLink><br /><searchLink fieldCode="DE" term="%22Ion+implantation%22">Ion implantation</searchLink><br /><searchLink fieldCode="DE" term="%22Rutherford+backscattering+spectrometry%22">Rutherford backscattering spectrometry</searchLink><br /><searchLink fieldCode="DE" term="%22Nuclear+physics%22">Nuclear physics</searchLink><br /><searchLink fieldCode="DE" term="%22Ion+bombardment%22">Ion bombardment</searchLink><br /><searchLink fieldCode="DE" term="%22Nuclear+engineering%22">Nuclear engineering</searchLink>
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  Data: The purpose of this study was to evaluate the impact of Nb+ ion implantation in WC/WS 2 nanostructures and their tribological properties. The films were deposited on silicon and stainless-steel substrates by DC and RF magnetron sputtering at 400 °C. Different concentrations for sputtering of the WC targets were used while the concentration for WS 2 was maintained constant for all the deposition processes. Nb ion implantation with an energy of 1.5 MeV and a dose of 6 × 1014 ions/cm2 at room temperature was done at the 3 MV Tandetron™ accelerator from "Horia Hulubei" National Institute for Physics and Nuclear Engineering – IFIN-HH. The topography of the samples was analyzed by atomic force microscopy (AFM). Rutherford backscattering spectrometry (RBS) investigations gave information regarding stoichiometry and thicknesses of the coatings while tribological properties were studied using a pin–on–ball tribometer before and after Nb ion implantation. We have found that after the Nb implantation the values measured for the coefficient of friction were lower as compared to the unimplanted samples thought to be due to the discrete amorphization sites which could be produced at this lower fluence by energy deposition through elastic and inelastic collisions. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
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  Data: <i>Copyright of Nuclear Instruments & Methods in Physics Research Section B is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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        Value: 10.1016/j.nimb.2018.08.002
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      – SubjectFull: Rutherford backscattering spectrometry
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              Text: Jul2019
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