APA (7th ed.) Citation

Zhang, X., Yang, Y., Zhang, Z., Geng, X., Hsu, C., Wu, W., . . . Pohl, P. (2021). Deposition and Characterization of RP-ALD SiO 2 Thin Films with Different Oxygen Plasma Powers. Nanomaterials (2079-4991), 11(5), 1173. https://doi.org/10.3390/nano11051173

Chicago Style (17th ed.) Citation

Zhang, Xiao-Ying, Yue Yang, Zhi-Xuan Zhang, Xin-Peng Geng, Chia-Hsun Hsu, Wan-Yu Wu, Shui-Yang Lien, Wen-Zhang Zhu, and Pawel Pohl. "Deposition and Characterization of RP-ALD SiO 2 Thin Films with Different Oxygen Plasma Powers." Nanomaterials (2079-4991) 11, no. 5 (2021): 1173. https://doi.org/10.3390/nano11051173.

MLA (9th ed.) Citation

Zhang, Xiao-Ying, et al. "Deposition and Characterization of RP-ALD SiO 2 Thin Films with Different Oxygen Plasma Powers." Nanomaterials (2079-4991), vol. 11, no. 5, 2021, p. 1173, https://doi.org/10.3390/nano11051173.