APA (7th ed.) Citation

Tkadletz, M., Lechner, A., Pölzl, S., & Schalk, N. (2021). Anisotropic wet-chemical etching for preparation of freestanding films on Si substrates for atom probe tomography: A simple yet effective approach. Ultramicroscopy, 230, N.PAG. https://doi.org/10.1016/j.ultramic.2021.113402

Chicago Style (17th ed.) Citation

Tkadletz, Michael, Alexandra Lechner, Silvia Pölzl, and Nina Schalk. "Anisotropic Wet-chemical Etching for Preparation of Freestanding Films on Si Substrates for Atom Probe Tomography: A Simple yet Effective Approach." Ultramicroscopy 230 (2021): N.PAG. https://doi.org/10.1016/j.ultramic.2021.113402.

MLA (9th ed.) Citation

Tkadletz, Michael, et al. "Anisotropic Wet-chemical Etching for Preparation of Freestanding Films on Si Substrates for Atom Probe Tomography: A Simple yet Effective Approach." Ultramicroscopy, vol. 230, 2021, p. N.PAG, https://doi.org/10.1016/j.ultramic.2021.113402.