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Anisotropic wet-chemical etching for preparation of freestanding films on Si substrates for atom probe tomography: A simple yet effective approach.

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Title: Anisotropic wet-chemical etching for preparation of freestanding films on Si substrates for atom probe tomography: A simple yet effective approach.
Authors: Tkadletz, Michael1 (AUTHOR) michael.tkadletz@unileoben.ac.at, Lechner, Alexandra2 (AUTHOR), Pölzl, Silvia1 (AUTHOR), Schalk, Nina1 (AUTHOR)
Source: Ultramicroscopy. Nov2021, Vol. 230, pN.PAG-N.PAG. 1p.
Subjects: Atom-probe tomography, Focused ion beams, Etching, Surface coatings
Abstract: • Anisotropic wet-chemical etching yields coatings protruding their Si substrate. • APT specimen can be easily prepared from the protruding coating. • FIB utilization and processing time are reduced. • Level of FIB complexity is reduced to standard operations. • The proposed approach simplifies APT specimen preparation of coatings on Si. A major drawback of atom probe tomography (APT) experiments of complex samples is the demanding and rather time consuming specimen preparation via the lift-out process. It usually requires a skilled operator for focused ion beam (FIB) preparation, and frequently overbooked FIB workstations represent a major bottleneck in sample throughput. Within this work, the authors present an alternative approach for APT specimen preparation of functional films and coatings on Si substrates via anisotropic wet-chemical etching. Utilizing this simple, yet effective approach, a freestanding section of the film to be investigated can be fabricated in a few steps. After the etching procedure, freestanding film posts and subsequently APT specimen can be easily prepared by basic FIB milling operations without the need for a lift-out process. Hence, this approach reduces FIB efforts to a minimum in terms of complexity and required machine utilization. [ABSTRACT FROM AUTHOR]
Copyright of Ultramicroscopy is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database: Engineering Source
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DbLabel: Engineering Source
An: 153030136
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PubType: Academic Journal
PubTypeId: academicJournal
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Items – Name: Title
  Label: Title
  Group: Ti
  Data: Anisotropic wet-chemical etching for preparation of freestanding films on Si substrates for atom probe tomography: A simple yet effective approach.
– Name: Author
  Label: Authors
  Group: Au
  Data: <searchLink fieldCode="AR" term="%22Tkadletz%2C+Michael%22">Tkadletz, Michael</searchLink><relatesTo>1</relatesTo> (AUTHOR)<i> michael.tkadletz@unileoben.ac.at</i><br /><searchLink fieldCode="AR" term="%22Lechner%2C+Alexandra%22">Lechner, Alexandra</searchLink><relatesTo>2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Pölzl%2C+Silvia%22">Pölzl, Silvia</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Schalk%2C+Nina%22">Schalk, Nina</searchLink><relatesTo>1</relatesTo> (AUTHOR)
– Name: TitleSource
  Label: Source
  Group: Src
  Data: <searchLink fieldCode="JN" term="%22Ultramicroscopy%22">Ultramicroscopy</searchLink>. Nov2021, Vol. 230, pN.PAG-N.PAG. 1p.
– Name: Subject
  Label: Subjects
  Group: Su
  Data: <searchLink fieldCode="DE" term="%22Atom-probe+tomography%22">Atom-probe tomography</searchLink><br /><searchLink fieldCode="DE" term="%22Focused+ion+beams%22">Focused ion beams</searchLink><br /><searchLink fieldCode="DE" term="%22Etching%22">Etching</searchLink><br /><searchLink fieldCode="DE" term="%22Surface+coatings%22">Surface coatings</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: • Anisotropic wet-chemical etching yields coatings protruding their Si substrate. • APT specimen can be easily prepared from the protruding coating. • FIB utilization and processing time are reduced. • Level of FIB complexity is reduced to standard operations. • The proposed approach simplifies APT specimen preparation of coatings on Si. A major drawback of atom probe tomography (APT) experiments of complex samples is the demanding and rather time consuming specimen preparation via the lift-out process. It usually requires a skilled operator for focused ion beam (FIB) preparation, and frequently overbooked FIB workstations represent a major bottleneck in sample throughput. Within this work, the authors present an alternative approach for APT specimen preparation of functional films and coatings on Si substrates via anisotropic wet-chemical etching. Utilizing this simple, yet effective approach, a freestanding section of the film to be investigated can be fabricated in a few steps. After the etching procedure, freestanding film posts and subsequently APT specimen can be easily prepared by basic FIB milling operations without the need for a lift-out process. Hence, this approach reduces FIB efforts to a minimum in terms of complexity and required machine utilization. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Ultramicroscopy is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1016/j.ultramic.2021.113402
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 1
        StartPage: N.PAG
    Subjects:
      – SubjectFull: Atom-probe tomography
        Type: general
      – SubjectFull: Focused ion beams
        Type: general
      – SubjectFull: Etching
        Type: general
      – SubjectFull: Surface coatings
        Type: general
    Titles:
      – TitleFull: Anisotropic wet-chemical etching for preparation of freestanding films on Si substrates for atom probe tomography: A simple yet effective approach.
        Type: main
  BibRelationships:
    HasContributorRelationships:
      – PersonEntity:
          Name:
            NameFull: Tkadletz, Michael
      – PersonEntity:
          Name:
            NameFull: Lechner, Alexandra
      – PersonEntity:
          Name:
            NameFull: Pölzl, Silvia
      – PersonEntity:
          Name:
            NameFull: Schalk, Nina
    IsPartOfRelationships:
      – BibEntity:
          Dates:
            – D: 01
              M: 11
              Text: Nov2021
              Type: published
              Y: 2021
          Identifiers:
            – Type: issn-print
              Value: 03043991
          Numbering:
            – Type: volume
              Value: 230
          Titles:
            – TitleFull: Ultramicroscopy
              Type: main
ResultId 1