APA (7th ed.) Citation

Lee, Y., Kim, Y., Son, J., & Chae, H. (2022). Low-temperature plasma atomic layer etching of molybdenum via sequential oxidation and chlorination. Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films, 40(2), 1. https://doi.org/10.1116/6.0001603

Chicago Style (17th ed.) Citation

Lee, Yebin, Yongjae Kim, Jiwon Son, and Heeyeop Chae. "Low-temperature Plasma Atomic Layer Etching of Molybdenum via Sequential Oxidation and Chlorination." Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films 40, no. 2 (2022): 1. https://doi.org/10.1116/6.0001603.

MLA (9th ed.) Citation

Lee, Yebin, et al. "Low-temperature Plasma Atomic Layer Etching of Molybdenum via Sequential Oxidation and Chlorination." Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films, vol. 40, no. 2, 2022, p. 1, https://doi.org/10.1116/6.0001603.