APA (7th ed.) Citation

Di Palma, V., Pianalto, A., Perego, M., Tallarida, G., Codegoni, D., & Fanciulli, M. (2023). Plasma-Assisted Atomic Layer Deposition of IrO 2 for Neuroelectronics. Nanomaterials (2079-4991), 13(6), 976. https://doi.org/10.3390/nano13060976

Chicago Style (17th ed.) Citation

Di Palma, Valerio, Andrea Pianalto, Michele Perego, Graziella Tallarida, Davide Codegoni, and Marco Fanciulli. "Plasma-Assisted Atomic Layer Deposition of IrO 2 for Neuroelectronics." Nanomaterials (2079-4991) 13, no. 6 (2023): 976. https://doi.org/10.3390/nano13060976.

MLA (9th ed.) Citation

Di Palma, Valerio, et al. "Plasma-Assisted Atomic Layer Deposition of IrO 2 for Neuroelectronics." Nanomaterials (2079-4991), vol. 13, no. 6, 2023, p. 976, https://doi.org/10.3390/nano13060976.