APA (7th ed.) Citation

Bouissil, A., Achache, S., Touaibia, D. E., Panicaud, B., Yazdi, M. A. P., Sanchette, F., & El Garah, M. (2023). Properties of a new TiTaZrHfW([sbnd]N) refractory high entropy film deposited by reactive DC pulsed magnetron sputtering. Surface & Coatings Technology, 462, N.PAG. https://doi.org/10.1016/j.surfcoat.2023.129503

Chicago Style (17th ed.) Citation

Bouissil, Abdelhakim, Sofiane Achache, Djallel Eddine Touaibia, Benoit Panicaud, Mohammad Arab Pour Yazdi, Frederic Sanchette, and Mohamed El Garah. "Properties of a New TiTaZrHfW([sbnd]N) Refractory High Entropy Film Deposited by Reactive DC Pulsed Magnetron Sputtering." Surface & Coatings Technology 462 (2023): N.PAG. https://doi.org/10.1016/j.surfcoat.2023.129503.

MLA (9th ed.) Citation

Bouissil, Abdelhakim, et al. "Properties of a New TiTaZrHfW([sbnd]N) Refractory High Entropy Film Deposited by Reactive DC Pulsed Magnetron Sputtering." Surface & Coatings Technology, vol. 462, 2023, p. N.PAG, https://doi.org/10.1016/j.surfcoat.2023.129503.