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Properties of a new TiTaZrHfW([sbnd]N) refractory high entropy film deposited by reactive DC pulsed magnetron sputtering.

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Title: Properties of a new TiTaZrHfW([sbnd]N) refractory high entropy film deposited by reactive DC pulsed magnetron sputtering.
Authors: Bouissil, Abdelhakim1,2 (AUTHOR) abdelhakim.bouissil@utt.fr, Achache, Sofiane1,2 (AUTHOR), Touaibia, Djallel Eddine1,2 (AUTHOR), Panicaud, Benoit3 (AUTHOR), Yazdi, Mohammad Arab Pour4 (AUTHOR), Sanchette, Frederic1,2 (AUTHOR), El Garah, Mohamed1,2 (AUTHOR) mohamed.el_garah@utt.fr
Source: Surface & Coatings Technology. Jun2023, Vol. 462, pN.PAG-N.PAG. 1p.
Subjects: Magnetron sputtering, Phase transitions, Thin films, Entropy, Reactive sputtering, Refractory materials, Metallic films, Atmospheric nitrogen
Abstract: In the last decades, refractory high entropy thin films have attracted more attention due to their superior properties at high temperatures. Besides the thermal stability, these new materials present good mechanical properties at high temperatures, which is interesting compared to conventional alloys. TiTaZrHfW(N) films are deposited by reactive magnetron sputtering in various argon/nitrogen atmospheres. Optical emission spectroscopy is performed to analyze the target poisoning conditions and optimize the deposition parameters. The nitrogen flow rate ratio R N = Φ N2 /(Φ N2 + Φ Ar) is varied from 0 to 29 %. XRD analyses show a phase transition from amorphous to B1(NaCl) single phased films once the nitrogen is added. For all nitrides, an out-of-plane {111} preferential orientation is observed, except for R N = 9 %, for which it changes to {200}. The morphology of the films changes from compact to columnar when the nitrogen ratio exceeds 5 %. The hardness and Young's modulus are also studied and present evolution with maximum values, 29 GPa and 257 GPa for R N = 9 % respectively. All nitrides show good thermal stability under vacuum at 800 °C for 3 h, compared to nitrogen-free metallic film, for which phase transition occurs. Nitrides show improved oxidation resistance compared to that of metallic film. • New refractory high entropy TiTaZrHfW(N) thin films nitrides deposited by magnetron sputtering. • Target poisoning in reactive mode was analyzed using Optical Emission Spectroscopy. • Effect of nitrogen content on microstructure, mechanical properties and oxidation has been studied. • Good thermal stability at high temperature was obtained. [ABSTRACT FROM AUTHOR]
Copyright of Surface & Coatings Technology is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
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An: 163308581
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  Label: Title
  Group: Ti
  Data: Properties of a new TiTaZrHfW([sbnd]N) refractory high entropy film deposited by reactive DC pulsed magnetron sputtering.
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  Data: <searchLink fieldCode="AR" term="%22Bouissil%2C+Abdelhakim%22">Bouissil, Abdelhakim</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)<i> abdelhakim.bouissil@utt.fr</i><br /><searchLink fieldCode="AR" term="%22Achache%2C+Sofiane%22">Achache, Sofiane</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Touaibia%2C+Djallel+Eddine%22">Touaibia, Djallel Eddine</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Panicaud%2C+Benoit%22">Panicaud, Benoit</searchLink><relatesTo>3</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Yazdi%2C+Mohammad+Arab+Pour%22">Yazdi, Mohammad Arab Pour</searchLink><relatesTo>4</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Sanchette%2C+Frederic%22">Sanchette, Frederic</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22El+Garah%2C+Mohamed%22">El Garah, Mohamed</searchLink><relatesTo>1,2</relatesTo> (AUTHOR)<i> mohamed.el_garah@utt.fr</i>
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  Data: <searchLink fieldCode="JN" term="%22Surface+%26+Coatings+Technology%22">Surface & Coatings Technology</searchLink>. Jun2023, Vol. 462, pN.PAG-N.PAG. 1p.
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  Data: <searchLink fieldCode="DE" term="%22Magnetron+sputtering%22">Magnetron sputtering</searchLink><br /><searchLink fieldCode="DE" term="%22Phase+transitions%22">Phase transitions</searchLink><br /><searchLink fieldCode="DE" term="%22Thin+films%22">Thin films</searchLink><br /><searchLink fieldCode="DE" term="%22Entropy%22">Entropy</searchLink><br /><searchLink fieldCode="DE" term="%22Reactive+sputtering%22">Reactive sputtering</searchLink><br /><searchLink fieldCode="DE" term="%22Refractory+materials%22">Refractory materials</searchLink><br /><searchLink fieldCode="DE" term="%22Metallic+films%22">Metallic films</searchLink><br /><searchLink fieldCode="DE" term="%22Atmospheric+nitrogen%22">Atmospheric nitrogen</searchLink>
– Name: Abstract
  Label: Abstract
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  Data: In the last decades, refractory high entropy thin films have attracted more attention due to their superior properties at high temperatures. Besides the thermal stability, these new materials present good mechanical properties at high temperatures, which is interesting compared to conventional alloys. TiTaZrHfW(N) films are deposited by reactive magnetron sputtering in various argon/nitrogen atmospheres. Optical emission spectroscopy is performed to analyze the target poisoning conditions and optimize the deposition parameters. The nitrogen flow rate ratio R N = Φ N2 /(Φ N2 + Φ Ar) is varied from 0 to 29 %. XRD analyses show a phase transition from amorphous to B1(NaCl) single phased films once the nitrogen is added. For all nitrides, an out-of-plane {111} preferential orientation is observed, except for R N = 9 %, for which it changes to {200}. The morphology of the films changes from compact to columnar when the nitrogen ratio exceeds 5 %. The hardness and Young's modulus are also studied and present evolution with maximum values, 29 GPa and 257 GPa for R N = 9 % respectively. All nitrides show good thermal stability under vacuum at 800 °C for 3 h, compared to nitrogen-free metallic film, for which phase transition occurs. Nitrides show improved oxidation resistance compared to that of metallic film. • New refractory high entropy TiTaZrHfW(N) thin films nitrides deposited by magnetron sputtering. • Target poisoning in reactive mode was analyzed using Optical Emission Spectroscopy. • Effect of nitrogen content on microstructure, mechanical properties and oxidation has been studied. • Good thermal stability at high temperature was obtained. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Surface & Coatings Technology is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1016/j.surfcoat.2023.129503
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 1
        StartPage: N.PAG
    Subjects:
      – SubjectFull: Magnetron sputtering
        Type: general
      – SubjectFull: Phase transitions
        Type: general
      – SubjectFull: Thin films
        Type: general
      – SubjectFull: Entropy
        Type: general
      – SubjectFull: Reactive sputtering
        Type: general
      – SubjectFull: Refractory materials
        Type: general
      – SubjectFull: Metallic films
        Type: general
      – SubjectFull: Atmospheric nitrogen
        Type: general
    Titles:
      – TitleFull: Properties of a new TiTaZrHfW([sbnd]N) refractory high entropy film deposited by reactive DC pulsed magnetron sputtering.
        Type: main
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            NameFull: Bouissil, Abdelhakim
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            NameFull: Achache, Sofiane
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            NameFull: Touaibia, Djallel Eddine
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            NameFull: Panicaud, Benoit
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            NameFull: Yazdi, Mohammad Arab Pour
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            NameFull: Sanchette, Frederic
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            NameFull: El Garah, Mohamed
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            – D: 15
              M: 06
              Text: Jun2023
              Type: published
              Y: 2023
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              Value: 02578972
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              Value: 462
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            – TitleFull: Surface & Coatings Technology
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