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Non-integral depth measurement of high-aspect-ratio multi-layer microstructures using numerical-aperture shaped beams.

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Title: Non-integral depth measurement of high-aspect-ratio multi-layer microstructures using numerical-aperture shaped beams.
Authors: Chein, Wei-Hsin1 (AUTHOR), Yang, Fu-Sheng1 (AUTHOR), Thakur, Komal1 (AUTHOR), Wu, Guo-Wei1 (AUTHOR), Chen, Liang-Chia1 (AUTHOR) lchen@ntu.edu.tw
Source: Optics & Lasers in Engineering. Jul2023, Vol. 166, pN.PAG-N.PAG. 1p.
Subjects: Bathymetry, Reflectometry, Numerical apertures, Microstructure, Signal-to-noise ratio
Abstract: • A new optical metrology technique for accurate depth measurement of individual high-aspect-ratio (HAR) multi-layer microstructures with high spatial resolution and signal-to-noise ratio (SNR) • The development is vital to semiconductor manufacturing and inline automated optical inspection (AOI). • A 28-fold improvement in SNR for measuring large-depth structures was achieved. This work presents a new optical metrology technique for accurate depth measurement of individual high-aspect-ratio (HAR) multi-layer microstructures with high spatial resolution and signal-to-noise ratio (SNR). To resolve the limitations of existing optical metrology techniques, light shaping with high light efficiency is optimized using numerical-aperture controlled laser beams. Experimental tests evidenced a 28-fold improvement in SNR for measuring large-depth structures when compared with measurements obtained using traditional broadband incoherent illumination. More importantly, instead of integral measurement characteristics currently limited by conventional spectral reflectometry or scatterometry, non-integral depth measurement of an individual microstructure from densely spaced microstructures such as through-silicon vias (TSV) and redistribution layers (RDL) can be realized using the developed optical measuring system with desired numerical aperture and field of view achieved simultaneously. As demonstrated by the measurement of a single submicron structure with linewidth as small as 0.6 µm and an aspect ratio of 5, the precision of depth measurement can be kept within a few nanometers. [ABSTRACT FROM AUTHOR]
Copyright of Optics & Lasers in Engineering is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database: Engineering Source
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Header DbId: egs
DbLabel: Engineering Source
An: 163426274
AccessLevel: 6
PubType: Academic Journal
PubTypeId: academicJournal
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  Data: Non-integral depth measurement of high-aspect-ratio multi-layer microstructures using numerical-aperture shaped beams.
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  Data: <searchLink fieldCode="AR" term="%22Chein%2C+Wei-Hsin%22">Chein, Wei-Hsin</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Yang%2C+Fu-Sheng%22">Yang, Fu-Sheng</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Thakur%2C+Komal%22">Thakur, Komal</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Wu%2C+Guo-Wei%22">Wu, Guo-Wei</searchLink><relatesTo>1</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Chen%2C+Liang-Chia%22">Chen, Liang-Chia</searchLink><relatesTo>1</relatesTo> (AUTHOR)<i> lchen@ntu.edu.tw</i>
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  Data: <searchLink fieldCode="JN" term="%22Optics+%26+Lasers+in+Engineering%22">Optics & Lasers in Engineering</searchLink>. Jul2023, Vol. 166, pN.PAG-N.PAG. 1p.
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  Data: <searchLink fieldCode="DE" term="%22Bathymetry%22">Bathymetry</searchLink><br /><searchLink fieldCode="DE" term="%22Reflectometry%22">Reflectometry</searchLink><br /><searchLink fieldCode="DE" term="%22Numerical+apertures%22">Numerical apertures</searchLink><br /><searchLink fieldCode="DE" term="%22Microstructure%22">Microstructure</searchLink><br /><searchLink fieldCode="DE" term="%22Signal-to-noise+ratio%22">Signal-to-noise ratio</searchLink>
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  Label: Abstract
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  Data: • A new optical metrology technique for accurate depth measurement of individual high-aspect-ratio (HAR) multi-layer microstructures with high spatial resolution and signal-to-noise ratio (SNR) • The development is vital to semiconductor manufacturing and inline automated optical inspection (AOI). • A 28-fold improvement in SNR for measuring large-depth structures was achieved. This work presents a new optical metrology technique for accurate depth measurement of individual high-aspect-ratio (HAR) multi-layer microstructures with high spatial resolution and signal-to-noise ratio (SNR). To resolve the limitations of existing optical metrology techniques, light shaping with high light efficiency is optimized using numerical-aperture controlled laser beams. Experimental tests evidenced a 28-fold improvement in SNR for measuring large-depth structures when compared with measurements obtained using traditional broadband incoherent illumination. More importantly, instead of integral measurement characteristics currently limited by conventional spectral reflectometry or scatterometry, non-integral depth measurement of an individual microstructure from densely spaced microstructures such as through-silicon vias (TSV) and redistribution layers (RDL) can be realized using the developed optical measuring system with desired numerical aperture and field of view achieved simultaneously. As demonstrated by the measurement of a single submicron structure with linewidth as small as 0.6 µm and an aspect ratio of 5, the precision of depth measurement can be kept within a few nanometers. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Optics & Lasers in Engineering is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1016/j.optlaseng.2023.107563
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      – Code: eng
        Text: English
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        PageCount: 1
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      – SubjectFull: Bathymetry
        Type: general
      – SubjectFull: Reflectometry
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      – SubjectFull: Numerical apertures
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      – SubjectFull: Microstructure
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      – SubjectFull: Signal-to-noise ratio
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      – TitleFull: Non-integral depth measurement of high-aspect-ratio multi-layer microstructures using numerical-aperture shaped beams.
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            NameFull: Chein, Wei-Hsin
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            NameFull: Yang, Fu-Sheng
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            NameFull: Wu, Guo-Wei
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            NameFull: Chen, Liang-Chia
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            – D: 01
              M: 07
              Text: Jul2023
              Type: published
              Y: 2023
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              Value: 166
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