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Advanced No-Clean Solder Paste for SiP Applications.

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Title: Advanced No-Clean Solder Paste for SiP Applications.
Authors: Rath, Santosh Kumar1 santoshkumar.rath@heraueus.com, Yam Lip Huei1, Sutino, Sylvia1, Chieng Yu Yuan1, Balasubramanian, Senthil Kumar1, Yee Ting Lo1, Agala, Joel1, HanWen Zhang1 hanwen.zhang@heraeus.com, Li-San Chan1 li-san.chan@heraeus.com, Sungsig Kang1, Mausner, Stefan2, Fritzsche, Sebastian2 sebastian.fritzsche@heraeus.com
Source: Advancing Microelectronics. Sep/Oct2021, Vol. 48 Issue 5, p12-18. 7p.
Subjects: Solder pastes, Cleaning compounds, Powders, Stencil work
Abstract: This paper reports the comparison of two solder pastes made using a no-clean flux platform and ultrafine SAC305 powders of Type 7 and Type 8+, made using Heraeus' Welco® technology. The application tests were carried out using 008004 components, the smallest passives used in SiPs. For the paste with Type 7 powder, the application tests complete with 12 hrs, of stencil evaluation have been reported, whereas for the paste with Type 8+ powder, a preliminary work-life evaluation has been reported. Both pastes have been compared for the release performance using area ratios down to 0.35, with both circular and square stencil opening apertures. Cleaning evaluation was carried out with some of the commercially available cleaning agents to assess the compatibility of the flux residue. It has been demonstrated that the no-clean solder paste with Type 7 powder has excellent stencil work-life performance until 12 hrs. of printing, with voids after reflow being less than 10%. The paste with Type 8+ shows better release performance vis-à-vis Type 7, down to an area ratio of 0.35, for square stencil opening aperture. Results from cleaning evaluation show the leftover contamination can be fully removed. [ABSTRACT FROM AUTHOR]
Copyright of Advancing Microelectronics is the property of International Microelectronics & Packaging Society and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database: Engineering Source
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DbLabel: Engineering Source
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PubType: Periodical
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  Data: Advanced No-Clean Solder Paste for SiP Applications.
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  Data: <searchLink fieldCode="AR" term="%22Rath%2C+Santosh+Kumar%22">Rath, Santosh Kumar</searchLink><relatesTo>1</relatesTo><i> santoshkumar.rath@heraueus.com</i><br /><searchLink fieldCode="AR" term="%22Yam+Lip+Huei%22">Yam Lip Huei</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Sutino%2C+Sylvia%22">Sutino, Sylvia</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Chieng+Yu+Yuan%22">Chieng Yu Yuan</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Balasubramanian%2C+Senthil+Kumar%22">Balasubramanian, Senthil Kumar</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Yee+Ting+Lo%22">Yee Ting Lo</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Agala%2C+Joel%22">Agala, Joel</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22HanWen+Zhang%22">HanWen Zhang</searchLink><relatesTo>1</relatesTo><i> hanwen.zhang@heraeus.com</i><br /><searchLink fieldCode="AR" term="%22Li-San+Chan%22">Li-San Chan</searchLink><relatesTo>1</relatesTo><i> li-san.chan@heraeus.com</i><br /><searchLink fieldCode="AR" term="%22Sungsig+Kang%22">Sungsig Kang</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Mausner%2C+Stefan%22">Mausner, Stefan</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AR" term="%22Fritzsche%2C+Sebastian%22">Fritzsche, Sebastian</searchLink><relatesTo>2</relatesTo><i> sebastian.fritzsche@heraeus.com</i>
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  Data: <searchLink fieldCode="JN" term="%22Advancing+Microelectronics%22">Advancing Microelectronics</searchLink>. Sep/Oct2021, Vol. 48 Issue 5, p12-18. 7p.
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  Data: <searchLink fieldCode="DE" term="%22Solder+pastes%22">Solder pastes</searchLink><br /><searchLink fieldCode="DE" term="%22Cleaning+compounds%22">Cleaning compounds</searchLink><br /><searchLink fieldCode="DE" term="%22Powders%22">Powders</searchLink><br /><searchLink fieldCode="DE" term="%22Stencil+work%22">Stencil work</searchLink>
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  Data: This paper reports the comparison of two solder pastes made using a no-clean flux platform and ultrafine SAC305 powders of Type 7 and Type 8+, made using Heraeus' Welco® technology. The application tests were carried out using 008004 components, the smallest passives used in SiPs. For the paste with Type 7 powder, the application tests complete with 12 hrs, of stencil evaluation have been reported, whereas for the paste with Type 8+ powder, a preliminary work-life evaluation has been reported. Both pastes have been compared for the release performance using area ratios down to 0.35, with both circular and square stencil opening apertures. Cleaning evaluation was carried out with some of the commercially available cleaning agents to assess the compatibility of the flux residue. It has been demonstrated that the no-clean solder paste with Type 7 powder has excellent stencil work-life performance until 12 hrs. of printing, with voids after reflow being less than 10%. The paste with Type 8+ shows better release performance vis-à-vis Type 7, down to an area ratio of 0.35, for square stencil opening aperture. Results from cleaning evaluation show the leftover contamination can be fully removed. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Advancing Microelectronics is the property of International Microelectronics & Packaging Society and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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              Text: Sep/Oct2021
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              Y: 2021
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