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Colloidal Quantum Dot Nanolithography: Direct Patterning via Electron Beam Lithography.

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Title: Colloidal Quantum Dot Nanolithography: Direct Patterning via Electron Beam Lithography.
Authors: Ko, Taewoo1 (AUTHOR) rdks95@korea.ac.kr, Kumar, Samir1 (AUTHOR) skumar@korea.ac.kr, Shin, Sanghoon1 (AUTHOR) ghost10s@korea.ac.kr, Seo, Dongmin2 (AUTHOR) dseo@semyung.ac.kr, Seo, Sungkyu1 (AUTHOR) dseo@semyung.ac.kr
Source: Nanomaterials (2079-4991). Jul2023, Vol. 13 Issue 14, p2111. 11p.
Subjects: Electron beam lithography, Semiconductor nanocrystals, Nanolithography, Quantum dots
Abstract: Micro/nano patterns based on quantum dots (QDs) are of great interest for applications ranging from electronics to photonics to sensing devices for biomedical purposes. Several patterning methods have been developed, but all lack the precision and reproducibility required to fabricate precise, complex patterns of less than one micrometer in size, or require specialized crosslinking ligands, limiting their application. In this study, we present a novel approach to directly pattern QD nanopatterns by electron beam lithography using commercially available colloidal QDs without additional modifications. We have successfully generated reliable dot and line QD patterns with dimensions as small as 140 nm. In addition, we have shown that using a 10 nm SiO2 spacer layer on a 50 nm Au layer substrate can double the fluorescence intensity compared to QDs on the Au layer without SiO2. This method takes advantage of traditional nanolithography without the need for a resist layer. [ABSTRACT FROM AUTHOR]
Copyright of Nanomaterials (2079-4991) is the property of MDPI and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
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Header DbId: egs
DbLabel: Engineering Source
An: 169332823
AccessLevel: 6
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PubTypeId: academicJournal
PreciseRelevancyScore: 0
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Items – Name: Title
  Label: Title
  Group: Ti
  Data: Colloidal Quantum Dot Nanolithography: Direct Patterning via Electron Beam Lithography.
– Name: Author
  Label: Authors
  Group: Au
  Data: <searchLink fieldCode="AR" term="%22Ko%2C+Taewoo%22">Ko, Taewoo</searchLink><relatesTo>1</relatesTo> (AUTHOR)<i> rdks95@korea.ac.kr</i><br /><searchLink fieldCode="AR" term="%22Kumar%2C+Samir%22">Kumar, Samir</searchLink><relatesTo>1</relatesTo> (AUTHOR)<i> skumar@korea.ac.kr</i><br /><searchLink fieldCode="AR" term="%22Shin%2C+Sanghoon%22">Shin, Sanghoon</searchLink><relatesTo>1</relatesTo> (AUTHOR)<i> ghost10s@korea.ac.kr</i><br /><searchLink fieldCode="AR" term="%22Seo%2C+Dongmin%22">Seo, Dongmin</searchLink><relatesTo>2</relatesTo> (AUTHOR)<i> dseo@semyung.ac.kr</i><br /><searchLink fieldCode="AR" term="%22Seo%2C+Sungkyu%22">Seo, Sungkyu</searchLink><relatesTo>1</relatesTo> (AUTHOR)<i> dseo@semyung.ac.kr</i>
– Name: TitleSource
  Label: Source
  Group: Src
  Data: <searchLink fieldCode="JN" term="%22Nanomaterials+%282079-4991%29%22">Nanomaterials (2079-4991)</searchLink>. Jul2023, Vol. 13 Issue 14, p2111. 11p.
– Name: Subject
  Label: Subjects
  Group: Su
  Data: <searchLink fieldCode="DE" term="%22Electron+beam+lithography%22">Electron beam lithography</searchLink><br /><searchLink fieldCode="DE" term="%22Semiconductor+nanocrystals%22">Semiconductor nanocrystals</searchLink><br /><searchLink fieldCode="DE" term="%22Nanolithography%22">Nanolithography</searchLink><br /><searchLink fieldCode="DE" term="%22Quantum+dots%22">Quantum dots</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: Micro/nano patterns based on quantum dots (QDs) are of great interest for applications ranging from electronics to photonics to sensing devices for biomedical purposes. Several patterning methods have been developed, but all lack the precision and reproducibility required to fabricate precise, complex patterns of less than one micrometer in size, or require specialized crosslinking ligands, limiting their application. In this study, we present a novel approach to directly pattern QD nanopatterns by electron beam lithography using commercially available colloidal QDs without additional modifications. We have successfully generated reliable dot and line QD patterns with dimensions as small as 140 nm. In addition, we have shown that using a 10 nm SiO2 spacer layer on a 50 nm Au layer substrate can double the fluorescence intensity compared to QDs on the Au layer without SiO2. This method takes advantage of traditional nanolithography without the need for a resist layer. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Nanomaterials (2079-4991) is the property of MDPI and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.3390/nano13142111
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 11
        StartPage: 2111
    Subjects:
      – SubjectFull: Electron beam lithography
        Type: general
      – SubjectFull: Semiconductor nanocrystals
        Type: general
      – SubjectFull: Nanolithography
        Type: general
      – SubjectFull: Quantum dots
        Type: general
    Titles:
      – TitleFull: Colloidal Quantum Dot Nanolithography: Direct Patterning via Electron Beam Lithography.
        Type: main
  BibRelationships:
    HasContributorRelationships:
      – PersonEntity:
          Name:
            NameFull: Ko, Taewoo
      – PersonEntity:
          Name:
            NameFull: Kumar, Samir
      – PersonEntity:
          Name:
            NameFull: Shin, Sanghoon
      – PersonEntity:
          Name:
            NameFull: Seo, Dongmin
      – PersonEntity:
          Name:
            NameFull: Seo, Sungkyu
    IsPartOfRelationships:
      – BibEntity:
          Dates:
            – D: 15
              M: 07
              Text: Jul2023
              Type: published
              Y: 2023
          Identifiers:
            – Type: issn-print
              Value: 20794991
          Numbering:
            – Type: volume
              Value: 13
            – Type: issue
              Value: 14
          Titles:
            – TitleFull: Nanomaterials (2079-4991)
              Type: main
ResultId 1