APA (7th ed.) Citation

Spadafora, M., Terrasi, A., Mirabella, S., Piro, A., Grimaldi, M., Scalese, S., . . . Carnera, A. (2005). Dry oxidation of MBE-SiGe films: Rate enhancement, Ge redistribution and defect injection. Materials Science in Semiconductor Processing, 8(1-3), 219. https://doi.org/10.1016/j.mssp.2004.09.032

Chicago Style (17th ed.) Citation

Spadafora, M., et al. "Dry Oxidation of MBE-SiGe Films: Rate Enhancement, Ge Redistribution and Defect Injection." Materials Science in Semiconductor Processing 8, no. 1-3 (2005): 219. https://doi.org/10.1016/j.mssp.2004.09.032.

MLA (9th ed.) Citation

Spadafora, M., et al. "Dry Oxidation of MBE-SiGe Films: Rate Enhancement, Ge Redistribution and Defect Injection." Materials Science in Semiconductor Processing, vol. 8, no. 1-3, 2005, p. 219, https://doi.org/10.1016/j.mssp.2004.09.032.