APA (7th ed.) Citation

Ding, B., Zhu, C., Wang, T., Li, L., Li, Z., Cheng, L., . . . Xia, C. (2024). Large‐area growth of monolayer MoS2 by using atmospheric‐pressure chemical vapor deposition with nucleation controlling process. Surface & Interface Analysis: SIA, 56(1), 22. https://doi.org/10.1002/sia.7264

Chicago Style (17th ed.) Citation

Ding, Binbin, et al. "Large‐area Growth of Monolayer MoS2 by Using Atmospheric‐pressure Chemical Vapor Deposition with Nucleation Controlling Process." Surface & Interface Analysis: SIA 56, no. 1 (2024): 22. https://doi.org/10.1002/sia.7264.

MLA (9th ed.) Citation

Ding, Binbin, et al. "Large‐area Growth of Monolayer MoS2 by Using Atmospheric‐pressure Chemical Vapor Deposition with Nucleation Controlling Process." Surface & Interface Analysis: SIA, vol. 56, no. 1, 2024, p. 22, https://doi.org/10.1002/sia.7264.